Nanomaterials can be game-changers in the arena of sustainable energy production because they may enable highly efficient thermoelectric energy conversion and harvesting. For this purpose, doped thin film oxides have been proven to be promising systems for achieving high thermoelectric performances. In this work, the design, realization, and experimental investigation of the thermoelectric properties exhibited by a set of five Al:ZnO thin films with thicknesses of 300 nm and Al doping levels ranging from 2 to 8 at.% are described. Using a multi-technique approach, the main structural and morphological features of the grown thin films are addressed, as well as the electrical and thermoelectrical transport properties. The results show that the samples exhibited a Seebeck coefficient absolute value in the range of 22–33 μV/K, assuming their maximum doping level was 8 at.%, while the samples’ resistivity was decreased below 2 × 10⁻³ Ohm·cm with a doping level of 3 at.%. The findings shine light on the perspectives of the applications of the metal ZnO thin film technology for thermoelectrics.

Graphene nanoribbons (GNRs) are a novel and intriguing class of materials in the field of nanoelectronics, since their properties, solely defined by their width and edge type, are controllable with high precision directly from synthesis. Here we study the correlation between the GNR structure and the corresponding device electrical properties. We investigated a series of field effect devices consisting of a film of armchair GNRs with different structures (namely width and/or length) as the transistor channel, contacted with narrowly spaced graphene sheets as the source-drain electrodes. By analyzing several tens of junctions for each individual GNR type, we observe that the values of the output current display a width-dependent behavior, indicating electronic bandgaps in good agreement with the predicted theoretical values. These results provide insights into the link between the ribbon structure and the device properties, which are fundamental for the development of GNR-based electronics.

Graphene-hexagonal boron nitride (hBN) scalable heterostructures are pivotal for the development of graphene-based high-tech applications. In this work, we demonstrate the realization of high-quality graphene-hBN heterostructures entirely obtained with scalable approaches. hBN continuous films were grown via ion beam-assisted physical vapor deposition directly on commercially available $SiO_2/Si$ and used as receiving substrates for graphene single-crystal matrixes grown by chemical vapor deposition on copper. The structural, chemical, and electronic properties of the heterostructure were investigated by atomic force microscopy, Raman spectroscopy, and electrical transport measurements. We demonstrate graphene carrier mobilities exceeding $10,000 cm^2/Vs$ in ambient conditions, 30% higher than those directly measured on $SiO_{2}/Si$. We prove the scalability of our approach by measuring more than 100 transfer length method devices over a centimeter scale, which present an average carrier mobility of $7500 \pm 850 cm^{2}/Vs$. The reported high-quality all-scalable heterostructures are of relevance for the development of graphene-based high-performing electronic and optoelectronic applications.