This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.

A series of the multicomponent thin films (binary: Ti-C; Ti-Ag and ternary: Ti-C-Ag; Ti-C-Al) were fabricated by Thermionic Vacuum Arc (TVA) technology in order to study the wear resistance and the anticorrosion properties. The effects of Ti amount on the microstructure, tribological and morphological properties were subsequently investigated. TVA is an original deposition method using a combination of anodic arc and electron gun systems for the growth of films. The samples were characterized using scanning electron microscope (SEM) and a transmission electron microscope (TEM) accompanied by selected area electron diffraction (SAED). Tribological properties were studied by a ball-on-disc tribometer in the dry regime and the wettability was assessed by measuring the contact angle with the See System apparatus. Wear Rate results indicate an improved sliding wear behavior for Ti-C-Ag: 1.31 × 10⁻⁷ mm³/N m (F = 2 N) compared to Ti-C-Al coating wear rate: 4.24 × 10⁻⁷ mm³/N m. On the other hand, by increasing the normal load to 3 N an increase to the wear rate was observed for Ti-C-Ag: 2.58 × 10⁻⁵ mm³ compared to 2.33 × 10⁻⁶ mm³ for Ti-C-Al coating.

Binary elemental plasma of carbon and silver was synthesized using the thermionic vacuum arc technology for the first time in this configuration. The structural investigations of the deposited silver/amorphous carbon (Ag/a-C) nanocomposites thin film on different materials, such as Si, glass, and stainless steel OLC 45 substrates performed by high-resolution transmission electron microscopy were reported, as well as the modification of the properties at the nanometer level.

To obtain highly homogeneous cobalt–nickel aluminate spinels with small crystallite sizes, CoNiAl alloy thin films were primarily deposited using Laser-induced Thermionic Vacuum Arc (LTVA) as a versatile method for performing processing of multiple materials, such as alloy/composite thin films, at a nanometric scale. Following thermal annealing in air, the CoNiAl metallic thin films were transformed into ceramic oxidic (Co,Ni)Al₂O₄ with controlled composition and crystallinity suitable for thermal stability and chemical resistance devices. Structural analysis revealed the formation of (Co,Ni)Al₂O₄ from the amorphous CoNiAl alloys. The mean crystallite size of the spinels was around 15 nm. Thermal annealing induces a densification process, increasing the film thickness together with the migration process of the aluminum toward the surface of the samples. The sheet resistance changed drastically from 200–240 Ω/sq to more than 10⁶ Ω/sq, revealing a step-by-step conversion of the metallic character of the thin film to a dielectric oxidic structure. These cermet materials can be used as inert anodes for the solid oxide fuel cells (SOFCs), which require not only high stability with respect to oxidizing gases such as oxygen, but also good electrical conductivity. These combination metal–ceramics are known as bi-layer anodes. By controlling the crystallite size and the interplay between the oxide/metal composite, a balance between stability and electrical conductivity can be achieved.

The current work aimed to characterize the morphology, chemical, and mechanical properties of Pt and PtTi thin films deposited via thermionic vacuum arc (TVA) method on glass and silicon substrates. The deposited thin films were characterized by means of a scanning electron microscope technique (SEM). The quantitative elemental microanalysis was done using energy-dispersive X-ray spectroscopy (EDS). The tribological properties were studied by a ball-on-disc tribometer, and the mechanical properties were measured using nanoindentation tests. The roughness, as well as the micro and nanoscale features, were characterized using atomic force microscopy (AFM) and transmission electron microscopy (TEM). The wettability of the deposited Pt and PtTi thin films was investigated by the surface free energy evaluation (SFE) method. The purpose of our study was to prove the potential applications of Pt-based thin films in fields, such as nanoelectronics, fuel cells, medicine, and materials science.

Laser-Induced Thermionic Vacuum Arc (LTVA) provides a better way to produce uniform metallic thin films than the classical Thermionic Vacuum Arc (TVA) method. In Ti-doped chromium thin films produced using LTVA, the amorphous chromium is superimposed with small bcc chromium nanoparticles. These amorphous/crystalline structures with small crystallites induce lower roughness and electrical resistivity, reducing electron–phonon scattering and increasing charge transport across LTVA thin films. A significant shift in resistivity for the LTVA samples is observed due to electron scattering on the phonon–crystalline structures in the TVA samples which exhibit larger crystallites. Meanwhile, the wettability measurements reveal a higher contact angle, resulting in a lower surface free energy and consecutively lower dissociation energy for the LTVA-produced thin films than the TVA samples.