Rodica VLADOIU

Dr. Rodica VLADOIU

Ovidius University of Constanta, Romania
orcid

Research Focus & Metrics

Academic Career Length

24Years (2003-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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27 February 2020 in Coatings
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RVRodica VLADOIU
Rodica VLADOIU
Milan TichyMilan Tichy
Milan Tichy
AMAurelia Mandes
Aurelia Mandes
VDVirginia Dinca-Balan
Virginia Dinca-Balan
PKPavel Kudrna
Pavel Kudrna
This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.

26 April 2012 in The European Physical Journal D
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VCV. Ciupina
V. Ciupina
RVRodica VLADOIU
Rodica VLADOIU
CLC. P. Lungu
C. P. Lungu
VDV. Dinca
V. Dinca
MCM. Contulov
M. Contulov
GPGabriel Prodan
Gabriel Prodan

1 November 2010 in Journal of Applied Physics
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RVRodica VLADOIU
Rodica VLADOIU
VCVictor Ciupina
Victor Ciupina
AMAurelia Mandes
Aurelia Mandes
VDVirginia Dinca
Virginia Dinca
MPMadalina Prodan
Madalina Prodan
GMGeavit Musa
Geavit Musa
Tantalum pentoxide (Ta2O5) thin films were synthesized using thermionic vacuum arc (TVA) technology. TVA is an original deposition method using a combination of anodic arc and electron gun system for the growth of thin films from solid precursors under vacuum of 10−6 Torr . The properties of the deposited Ta2O5 thin films were investigated in terms of wettability, refractive index, morphology, and structure. The surface free energy was determined by means of surface energy evaluation system indicating a hydrophilic character and the refractive index was measured by Filmetrics F20 device. The morphology was determined from bright field transmission electron microscopy (TEM) image performed by Philips CM 120 ST TEM system. It exhibits nanoparticles of 3–6 nm diameter smoothly distributed. Selected area electron diffraction pattern revealed the contrast fringes given by complex polycrystalline particles included in the amorphous film. The measured fringes could be indexed using monoclinic structure of Ta2O5 .

23 June 2009 in The European Physical Journal D
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RVRodica VLADOIU
Rodica VLADOIU
VDVirginia Dinca-Balan
Virginia Dinca-Balan
GMG. Musa
G. Musa

1 May 2015 in Plasma Sources Science and Technology
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RVRodica VLADOIU
Rodica VLADOIU
AMAurelia Mandes
Aurelia Mandes
VBVirginia Dinca Balan
Virginia Dinca Balan
GPGabriel Prodan
Gabriel Prodan
PKPavel Kudrna
Pavel Kudrna
MTMilan Tichý
Milan Tichý
The aim of this paper is to report on magnesium plasma diagnostics and to investigate the properties of thin Mg films deposited on Si and glass substrates by using thermionic vacuum arc (TVA) technology. TVA is an original deposition method using a combination of anodic arc and powerful electron gun system (up to 600 W) for the growth of thin films from solid precursors under a vacuum of 10 −6 Torr. Due to the comparatively high deposition rate as well as comparatively high plasma potential—around 0.5 kV—plasma diagnostics were carried out by a heated probe that prevents layer deposition on the probe surface. The estimated value of electron density was in the order of 1.0 × 10 16 m −3 and the electron temperature varied between 4 × 10 4 and 1.2 × 10 5 K (corresponding to two different discharge conditions). The thin Mg films were investigated using SEM images and TEM analyses provided with HR-TEM and SAED facilities. According to the SAED patterns the structure of the films can be indexed as two forms: hexagonal structure for Mg and cubic structure for MgO; the peak value of grain size distribution was 91.29 nm in diameter for Mg TVA/Si and 61.06 nm for Mg TVA/Gl.

20 March 2018 in Coatings
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Journal Article
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AMAurelia Mandes
Aurelia Mandes
RVRodica VLADOIU
Rodica VLADOIU
GPGabriel Prodan
Gabriel Prodan
VDVirginia Dinca-Balan
Virginia Dinca-Balan
CPCorneliu Porosnicu
Corneliu Porosnicu
PDPaul Pavel Dinca
Paul Pavel Dinca
A series of the multicomponent thin films (binary: Ti-C; Ti-Ag and ternary: Ti-C-Ag; Ti-C-Al) were fabricated by Thermionic Vacuum Arc (TVA) technology in order to study the wear resistance and the anticorrosion properties. The effects of Ti amount on the microstructure, tribological and morphological properties were subsequently investigated. TVA is an original deposition method using a combination of anodic arc and electron gun systems for the growth of films. The samples were characterized using scanning electron microscope (SEM) and a transmission electron microscope (TEM) accompanied by selected area electron diffraction (SAED). Tribological properties were studied by a ball-on-disc tribometer in the dry regime and the wettability was assessed by measuring the contact angle with the See System apparatus. Wear Rate results indicate an improved sliding wear behavior for Ti-C-Ag: 1.31 × 10−7 mm3/N m (F = 2 N) compared to Ti-C-Al coating wear rate: 4.24 × 10−7 mm3/N m. On the other hand, by increasing the normal load to 3 N an increase to the wear rate was observed for Ti-C-Ag: 2.58 × 10−5 mm3 compared to 2.33 × 10−6 mm3 for Ti-C-Al coating.