Shitian Huang

Mr. Shitian Huang


Research Focus & Metrics

Academic Career Length

5Years (2022-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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5 July 2023 in Electronics
Verified
Journal Article
Open access
PDF file
SHShitian Huang
Shitian Huang
YSYao Shuai
Yao Shuai
LLLu Lv
Lu Lv
ZWZijie Wei
Zijie Wei
WFWei Fan
Wei Fan
WZWanli Zhang
Wanli Zhang
This paper reports an LNO surface acoustic wave (SAW) resonator based on a shear horizontal mode with high operating frequency over 3 GHz, large electromechanical coupling of 33.54%, Q factor of 380, and a relatively good figure of merit (FOM) of 127. Combing crystal-ion-slicing (CIS) technology with a room temperature bonding method, a 4-inch single crystalline LNO thin film on silicon is prepared successfully. The influence of damaged LNO film on crystalline quality and SAW performance is comprehensively analyzed. After totally removing the damaged layer, the electromechanical coupling and Q factor is significantly improved. The high-performance SAW resonator possesses the potential to meet the requirements of SAW filters for the fifth-generation (5G) communication in terms of high frequency, large bandwidth, and a high-quality factor.

5 December 2022 in Electronics
Verified
Journal Article
Open access
PDF file
LLLu Lv
Lu Lv
YSYao Shuai
Yao Shuai
SHShitian Huang
Shitian Huang
DZDailei Zhu
Dailei Zhu
YWYuedong Wang
Yuedong Wang
WZWanli Zhang
Wanli Zhang
To solve the problem of filter bandwidth in 5G communication, it is urgent to develop an acoustic resonator with a large effective electromechanical coupling coefficient (Keff2). In this paper, the dependence between the resonance area and the performance of the bulk acoustic wave (BAW) resonator is studied. The solidly mounted resonators (SMRs) based on 43° Y cut lithium niobate (LN) were fabricated by the wafer transfer technique. The on-chip inductor was integrated with the BAW resonator through a pad electrode. Resonators with different resonant areas were fabricated and tested. Finite element modeling (FEM) simulation of acoustic resonators and electromagnetic (EM) simulation of layout were carried out, respectively. The Modified Butterworth Van Dyke (MBVD) model was used to analyze the results, and simulation of the Mason model was adopted. The results show that the dependency relationship between the resonant area and the effective electromechanical coupling coefficient can be induced by on-chip inductance. In the resonant area range of 20 × 20 μm2~160 × 160 μm2, the Keff2 increases from 11.97% to 43.28%.