Wei-You Hsu

Wei-You Hsu

Materials science and engineering, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
orcid

Research Focus & Metrics

Academic Career Length

7Years (2020-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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22 June 2023 in Applied Surface Science
Verified
Journal Article
Closed access
MYMin-Hsun Yu
Min-Hsun Yu
JOJia-Juen Ong
Jia-Juen Ong
DTDinh-Phuc Tran
Dinh-Phuc Tran
WCWei-Lan Chiu
Wei-Lan Chiu
WHWei-You Hsu
Wei-You Hsu
Chih ChenChih Chen
Chih Chen

10 December 2023 in Materials Science and Engineering: A
Verified
Journal Article
Closed access
KLKang-Ping Lee
Kang-Ping Lee
BCBo-Yan Chen
Bo-Yan Chen
YLYi-Quan Lin
Yi-Quan Lin
YHYu-Wen Hung
Yu-Wen Hung
WHWei-You Hsu
Wei-You Hsu
Chih ChenChih Chen
Chih Chen

8 May 2023 in Nanomaterials
Verified
Journal Article
Open access
PDF file
PHPin-Syuan He
Pin-Syuan He
DTDinh-Phuc Tran
Dinh-Phuc Tran
TKTing-Yu Kuo
Ting-Yu Kuo
WHWei-You Hsu
Wei-You Hsu
HLHuai-En Lin
Huai-En Lin
Chih ChenChih Chen
Chih Chen
In this study, thermal and argon (Ar) plasma/wetting treatments were combined to enhance the bonding strength of polyimide (PI) films. Attenuated total reflectance-Fourier transform infrared spectroscopy (ATR-FTIR) was used to analyze the changes in the PI imidization degrees. The contact angles of the PI films were also measured. The results show that the contact angles of the fully cured PI films markedly decreased from 78.54° to 26.05° after the Ar plasma treatments. X-ray photoelectron spectroscopy (XPS) analysis was also conducted on the PI surfaces. We found that the intensities of the C-OH and C-N-H bonds increased from 0% to 13% and 29% to 57%, respectively, after Ar plasma activation. Such increases in the C-OH and C-N-H intensities could be attributed to the generation of dangling bonds and the breakage of the imide ring or polymer long chains. Shear tests were also conducted to characterize the bonding strength of the PI films, which, after being treated with the appropriate parameters of temperature, plasma power, and wetting droplets, was found to be excellent at greater than 35.3 MPa.

29 August 2023 in Nanomaterials
Verified
Journal Article
Open access
PDF file
WHWei-You Hsu
Wei-You Hsu
SYShih-Chi Yang
Shih-Chi Yang
YLYou-Yi Lin
You-Yi Lin
WHWan-Zhen Hsieh
Wan-Zhen Hsieh
King-Ning TUKing-Ning TU
King-Ning TU
Chih ChenChih Chen
Chih Chen
X-ray nanodiffraction was used to measure the thermal stress of 10 µm nanotwinned Cu bumps in Cu/SiO2 hybrid structures at −55 °C, 27 °C, 100 °C, 150 °C, and 200 °C. Bonding can be achieved without externally applied compression. The X-ray beam size is about 100 nm in diameter. The Cu bump is dominated by (111) oriented nano-twins. Before the hybrid bonding, the thermal stress in Cu bumps is compressive and remains compressive after bonding. The average stress in the bonded Cu joint at 200 °C is as large as −169.1 MPa. In addition, using the strain data measured at various temperatures, one can calculate the effective thermal expansion coefficient (CTE) for the 10 µm Cu bumps confined by the SiO2 dielectrics. This study reports a useful approach on measuring the strain and stress in oriented metal bumps confined by SiO2 dielectrics. The results also provide a deeper understanding on the mechanism of hybrid bonding without externally applied compression.

30 November 2023 in Journal of Materials Research and Technology
Verified
Journal Article
Open access
HTHsiang-Hou Tseng
Hsiang-Hou Tseng
MLMan-Chi Lan
Man-Chi Lan
WHWei-You Hsu
Wei-You Hsu
JOJia-Juen Ong
Jia-Juen Ong
DTDinh-Phuc Tran
Dinh-Phuc Tran
Chih ChenChih Chen
Chih Chen

24 September 2023 in Materials Science and Engineering: A
Verified
Journal Article
Closed access
WHWei-You Hsu
Wei-You Hsu
DTDinh-Phuc Tran
Dinh-Phuc Tran
YLYu-Jin Li
Yu-Jin Li
Chih ChenChih Chen
Chih Chen