To investigate the damage threshold and mechanism of a mid-infrared HgCdTe focal plane array (FPA) detector, relevant experimental and theoretical studies were conducted. The line damage threshold of a HgCdTe FPA detector may be within the range of 0.59 Jcm⁻² to 0.71 Jcm⁻². The full frame damage threshold of the detector may be in the range of 0.86 Jcm⁻² to 1.17 Jcm⁻². Experimental results showed that when the energy density reaches 1.17 Jcm⁻², the detector exhibits irreversible full frame damage and is completely unable to image. Based on the finite element method, a three-dimensional model of HgCdTe FPAs detector was established to study the heat transfer mechanism, internal stress, and damage sequence. When HgCdTe melts, we think that the detector is damaged. Under these conditions, the theoretical damage threshold calculated using the detector model is 0.55 Jcm⁻². The difference between theoretical and experimental values was analyzed. The relationship between damage threshold and pulse width was also studied. It was found that when the pulse width is less than 1000 ns, the damage threshold characterized by peak power density is inversely proportional to pulse width. This relationship can help us predict the experimental damage threshold of an FPA detector. This model is reasonable and convenient for studying the damage of FPA detectors with a mid-infrared pulse laser. The research content in this article has important reference significance for the damage and protection of HgCdTe FPA detectors.

Femtosecond (fs) and nanosecond (ns) laser pulses have their own advantages and disadvantages in laser-induced breakdown spectroscopy (LIBS). This paper investigated fs + ns (FN) dual-pulse (DP) LIBS, utilizing the respective advantages of two laser pulses in LIBS. Compared to traditional single ns LIBS, applying a smaller energy fs pulse could effectively improve the LIBS emission. Firstly, this study discussed the spectra of FN DP LIBS with overlapping pulse time—that is, the FN DP inter-pulse delay (DID) was 0 μs. The results showed that the spectra were increased to three times that of a single ns LIBS. Subsequently, the DID between the two pulses was optimized. The results showed that as the DID between the two pulses increased, the spectral emission first increased and then decreased, ultimately remaining unchanged. The optimized DID was approximately 2 μs. Finally, using this optimized DID, the variation of spectral intensity with ns laser energy was discussed in DP LIBS. The spectral enhancement ratio increased from 3 with 0 μs DID to 6 with 2 μs DID. The investigation provides a reference in the application of FN DP LIBS element analysis.

The study used linearly and circularly polarized femtosecond pulsed lasers to irradiate a Ta₂O₅/SiO₂ film. Firstly, the damage thresholds of the film for linearly and circularly polarized femtosecond pulsed lasers were measured in 1-on-1 mode. The results showed that the damage threshold (1.70 J/cm²) under a circularly polarized laser was higher than that (1.68 J/cm²) under a linearly polarized laser. For femtosecond lasers, the multi-photon ionization cross-section under circular polarization was lower than that under linear polarization. The lower ionization rate under circular polarization led to a higher damage threshold compared to the case under linear polarization. Secondly, the damage morphology of the film irradiated by linearly and circularly polarized femtosecond lasers was observed by microscope. The damage caused by linearly polarized laser was more evident than that caused by the circularly polarized laser. Finally, the damage thresholds induced by linearly and circularly polarized femtosecond pulsed lasers were measured in S-on-1 (S = 2, 5, and 10) mode. For the same S value (2, 5, or 10), the damage threshold under the circularly polarized laser was higher than that under the linearly polarized laser. The damage thresholds under two polarized laser pulses decreased with an increase in the number of laser shots, indicating that repeated laser pulses had a cumulative effect on the damage of the film.