This study investigated the relationship between the superconducting properties, electrical properties, sputtering process parameters, and post-growth annealing of NbN films. Four series of NbN films were deposited by DC magnetron sputtering using different process parameters. With the assistance of a four-probe method, the superconducting performance presented first an increase and then a decreasing trend as the resistance of the prepared films increased, which could be attributed to the variation of the N/Nb ratio in the films. This correlation implied that it is very challenging to fabricate films with both high Tc and high resistance or high Tc and low resistance by adjusting the sputtering process parameters. In order to overcome these bottlenecks, a series of films were deposited on Si, GaN/Si, SiN/Si, AlN/Si, and AlN/sapphire substrates, and the film deposited on Si was annealed at 900 °C. Annealing reduced the stress of the films on the buffer layer and increased the grain size and crystallinity of the films, except for the films on the GaN/Si substrates. This resulted in a significant decrease in the resistivity of the film and a significant increase in the superconducting transition temperature.

This paper investigates the relationship between the physical properties of NbN thin films and a series of different substrates/buffer layers used for the thin film growth. Substrates, including 4H-SiC, AlN/Si, AlN/sapphire, and annealed AlN/sapphire, were selected for NbN film deposition via DC magnetron sputtering. Post-deposition annealing was also employed to study its impact on the films’ quality. Comprehensive characterizations were performed on NbN films, focusing on superconducting critical temperature (T_C), transition width (ΔT_C), crystalline quality, and surface roughness. The results demonstrate that the annealed NbN films grown on 4H-SiC substrates with the highest crystalline quality exhibit optimal crystalline quality, achieving a T_C of 16.3 K. Experimental results reveal intrinsic correlations between the critical properties of NbN superconducting thin films and substrate structural characteristics; the impact of post-growth annealing on the T_C is also studied.