Suppression of Fresnel reflection from diffraction grating surfaces is very important for many optical configurations. In this work, we propose a simple method to fabricate subwavelength structures on fused-silica transmission grating for optical antireflection. The fabrication is a one-step self-masking reaction ion etching (RIE) process without using any masks. According to effective medium theory, random cone-shaped nanopillars which are integrated on the grating surface can act as an antireflective layer. Effects of the nanostructures on the reflection and transmission properties of the grating were investigated through experiments and simulations. The nanostructure surface exhibited excellent antireflection performance, where the reflection of the grating surface was suppressed to zero over a wide range of incident angles. Results also revealed that the etching process can change the duty cycle of the grating, and thus the diffraction orders if there are oblique lateral walls. The simulation results were in good agreement with the experimental ones, which verified our physical comprehension and the corresponding numerical model. The proposed method would offer a low-cost and convenient way to improve the antireflective performance of transmission-diffractive elements.

The simple yet efficient and versatile fabrication of colloidal crystals was investigated based on the solidification-induced colloidal crystallization process with particle/water suspension as precursor. The resulting colloidal crystals were constituted by crystal grains with sizes ranging from several tens of micrometers to a few millimeters. Each of the grains had a close-hexagonal array of colloids, which endowed the bulk colloidal crystal powders with some specific optical properties. The freezing of water was shown as the major driving force to form colloidal crystal grains, which supersaturated the solution with nanoparticles and thus induced the formation and growth of colloidal crystal seeds. This process is intrinsically different from those conventional methods based on shearing force, surface tension, columbic interaction or magnetic interaction, revealing a new strategy to fabricate colloidal crystals in a convenient and efficient way.

The fabrication of SSD-free fused silica optics is a crucial objective for high-power laser applications. To treat the surface of polished fused silica, a combination of RIE/RIBE and deep-controlled etch (DCE) techniques are typically employed. Currently, it is important to consider and study the ideal etching depth and precision while using combined etching techniques to remove the identified SSD. Herein, we present a novel approach to identify the distribution of SSD in fused silica, which corresponds to a specific grinding/polishing process condition. Our method involves using a mobile RIBE to perform cone cutting and remove material from the polished fused silica surface. Afterward, we etch the optical element’s surface with HF to visualize the subsurface cracks and understand their relationship with the RIBE depth. Through a systematic investigation of the combined etching technique, we establish a correlation between the depth of RIBE and DCE and the performance of laser damage. The combined etching technique can be implemented as a dependable approach to treat the surface/subsurface defects in fused silica and has the potential to improve laser damage resistance significantly.

Reactive ion etching (RIE) with fluorocarbon plasma is a facile method to tracelessly remove the subsurface damage layer of fused silica but has the drawback of unsatisfactory improvement in laser damage resistance due to the induction of secondary defects. This work proposes to incorporate O₂ into the CHF₃/Ar feedstock of RIE to suppress the formation of secondary defects during the etching process. Experimental results confirm that both the chemical structural defects, such as oxygen-deficient center (ODC) and non-bridging oxygen hole center (NBOHC) defects, and the impurity element defects, such as fluorine, are significantly reduced with this method. Laser-induced damage resistance is consequently greatly improved, with the 0% probability damage threshold increasing by 121% compared to the originally polished sample and by 41% compared to the sample treated with conventional RIE.

Nd:glass has become the predominant gain medium for achieving high-energy laser outputs to the order of hundreds of joules, owing to its high energy storage capacity, capacity for large apertures, and excellent optical homogeneity. However, in large-aperture Nd:glass laser amplifiers, surface distortion induced by mechanical clamping is a principal factor degrading laser wavefront quality. To systematically investigate the influence of clamping methods and structural parameters on wavefront distortion, this study employs a combined approach of numerical simulation and experimental validation. The results demonstrate that side-symmetric clamping induces low-frequency wavefront aberrations dominated by first-order astigmatism. The magnitude of these aberrations intensifies with an increased number of clamping screws but is relatively insensitive to variations in screw spacing. In contrast, front-side clamping generates significantly lower wavefront aberrations than side clamping. Further analysis indicates that the clamping-induced wavefront aberration components are predominantly low-frequency, arising primarily from macroscopic surface profile changes. Based on these findings, this paper proposes optimization strategies for clamping force and principles for selecting key structural parameters, thereby providing a theoretical foundation and critical technical support for the low-aberration clamping design of Nd:glass components in high-power laser systems.