Scanning probe lithography (SPL) is a versatile nanofabrication method that employs a scanning probe microscope (SPM) to generate patterns and nanoscale structures on surfaces. Typically, an atomic force microscope (AFM) is the preferred type of SPM for nanolithography and in situ characterization based on the probe–sample interaction. However, the maximum area of the existing SPL is mainly limited by scanner stroke of the AFM and usually less than $100\times 100$ μm $^{2}$ . Ultralarge-area nanofabrication can be achieved by using a “step and scan” manner but leading to stitching errors and low throughput. This article proposes a novel ultralarge-area stitchless SPL and high-throughput in situ characterization system utilizing a leaf spring-based nanomanipulator, which offers a maximum scanning area of $2\times 2$ mm $^{2}$ . Further, we propose a novel optimized passband loss filter for the repetitive control of the nanomanipulator to realize high-bandwidth and high-precision trajectory tracking. Experimental results indicate that the proposed control method achieves satisfactory tracking performance for a triangular wave with an amplitude of 500 μm. Compared with the existing SPL systems, we achieve stitchless nanolithography at a speed of $\sim $ 2 mm/s and high-throughput in situ characterization in the range of $500\times 500$ μm $^{2}$ . This system opens up significant avenues for the research and application of ultralarge-area nanofabrication and in situ characterization.

Hybrid reluctance actuators, known for their remarkable motor constant and bidirectional noncontact force, emerge as superior alternatives to piezoelectric stack or voice coil actuators. A key challenge in large-stroke ( $>1$ mm) hybrid reluctance actuators is their inherent nonlinearity characterized by fluctuations in negative stiffness and motor constant. To tackle this problem, we propose a large-stroke reluctance-actuated nanopositioner by leveraging on a compliant stiffness compensator to reduce the adverse impact of the reluctance actuator's nonlinearity. We establish the relationship between the system's equivalent stiffness and the combined effects of the reluctance actuator and compliant compensator. Based on a novel nonlinear decoupling mechanism, the fluctuation in the system's equivalent stiffness is significantly reduced, enabling advanced model-based controls and facilitating high precision motion. A prototype system compatible with atomic force microscopy is established, and the system's performance is validated using a repetitive control with the recently developed optimized passband loss filter, demonstrating nanometric precision in large-range and high-frequency scanning. The experimental results reveal that the proposed system achieves a precision of 17.6 nm (RMSE) for a 2 mm triangular wave at 1 Hz and 8.2 nm (RMSE) for a $20\,\mu$ m triangular wave at 80 Hz. Further validation through atomic force microscopy confirms the system's capability in large-range and high-speed characterization. These results suggest that the proposed system could significantly advance the use of large-stroke reluctance-actuated nanopositioners for millimeter-range applications.