In extreme ultraviolet (EUV) lithography, tin droplets evaporate and subsequently coat various surfaces including the collector mirrors. To clean off the tin, a hydrogen plasma is often used, but as a result, an unstable by-product, stannane (SnH4) is formed. The physicochemical characteristics of this gas, its formation in a plasma process, and its interaction with various materials have not been explored and understood completely. Here, the electron ionization mass spectrum of SnH4 is presented. All ten natural abundance isotopes were observed experimentally for each fragment, i.e., Sn+, SnH+, SnH2+, and SnH3+. Density functional electronic structure theory was used to calculate the optimized ground state geometries of these gas phase species and their relative stabilities and helped explain the absence of SnH4+ in the observed signals. The density of the liquid, its cracking pattern, and the surface morphology of its deposits were examined. The surface of the deposited tin film resulting from the decomposition and subsequent oxidation was characterized by x-ray photoelectron spectroscopy. The main species found at the surface were metallic tin and tin (II) oxide (SnO). The detailed characterization of stannane should help correctly identify it in EUV lithographic processes and develop approaches in the future to mitigate its decomposition and redeposition on the collector mirrors or vacuum chamber walls.

Lithium manganese oxide (LiMn₂O₄) is an effective cathode material for high-capacity lithium-ion (Li-ion) batteries. Therefore, to optimize battery efficiency, it is essential to understand how sputtering deposition conditions affect the quality and performance of LiMn₂O₄. This research examines how argon deposition pressure affects the stoichiometric characteristics and electrochemical performance of LiMn₂O₄. The study finds that changing argon deposition pressures, from a low of 5 mTorr to a high of 30 mTorr, results in the formation of different coating stoichiometries. At low argon deposition pressures, stoichiometric LiMn₂O₄ cathode coatings formed, exhibiting the highest discharge capacity of 115 mAh/g. Conversely, at high argon deposition pressures, non-stoichiometric LiMn₂O₄ with lithium deficiency was produced. These coatings exhibited diminished electrochemical behavior, achieving a discharge capacity of only 70 mAh/g at 5 mTorr. The lack of lithium resulted in a significant reduction in electrochemical performance, indicated by a high surface charge transfer resistance (R₂ = 48,529 Ω), which led to a low discharge capacity of 40 mAh/g.

We have studied the influence of La and Cr doping on the crystal structure and magnetism of Aurivillius multiferroic Bi₅Ti₃FeO₁₅ and demonstrated the resilience of this structure type.