As a transdermal drug delivery technology, microneedle array (MNA) has the characteristics of painless, minimally invasive, and precise dosage. This work discusses and compares the new MNA mold prepared by our group using MEMS technology. First, we introduced the planar pattern-to-cross-section technology (PCT) method using LIGA (Photolithography, Galvanogormung, Abformung) technology to obtain a three-dimensional structure similar to an X-ray mask pattern. On this basis, combined with polydimethylsiloxane (PDMS) transfer technology and electroplating process, metal MNA can be prepared. The second method is to use silicon wet etching combined with the SU-8 process to obtain a PDMS quadrangular pyramid MNA using PDMS transfer technology. Third method is to use the tilting rotary lithography process to obtain PDMS conical MNA on SU-8 photoresist through PDMS transfer technology. All three processes utilize parallel subtractive manufacturing methods, and the error range of reproducibility and accuracy is 2–11%. LIGA technology produces hollow MNA with an aspect ratio of up to 30, which is used for blood extraction and drug injection. The height of the MNA prepared by the engraving process is about 600 μm, which can achieve a sustained release effect together with a potential systemic delivery. The height of the MNA prepared by the ultraviolet exposure process is about 150 μm, which is used to stimulate the subcutaneous tissue.

In the field of non-silicon MEMSs (micro-electro-mechanical systems), nickel, with its mature preparation method, good compatibility with non-silicon MEMS processes, and excellent mechanical properties, is one of the commonly used structural materials. By effectively combining it with non-silicon MEMS processes, nickel is widely used in typical process systems such as LIGA (Lithography, Galvanoformung, Abformung)/UV-LIGA (Ultraviolet Lithography, Galvanoformung, Abformung). However, with the rapid development of the non-silicon MEMS field, pure nickel materials are no longer able to meet current material demands. Alternatively, nickel–cobalt composite materials have excellent mechanical properties, thermal stability, corrosion resistance, and good adaptability to processing technology because cobalt has unique advantages as a reinforcing phase, including excellent wear resistance, corrosion resistance, and high hardness. This article examines the current methods for preparing nickel–cobalt alloys by focusing on composite electrodeposition of coatings and analyzing their advantages and disadvantages. Based on this, the effect of the composite electrodeposition conditions on the formation mechanism of nickel–cobalt alloy coatings is discussed. Then, the research status of composite electrodeposition methods mainly based on nickel–cobalt nanocomposites is discussed. Finally, a new direction for future work on nickel–cobalt composite materials mainly composed of nickel–cobalt nanomaterials prepared by composite electrodeposition is proposed, and its application prospects in non-silicon MEMS fields are discussed.

This article presents a single-crystal piezoelectric energy harvester (PEH) with a trapezoidal hollow hole that can obtain high energy density at low frequency. Harvesters with a hollow structure were fabricated through a series of manufacturing processes such as thermocompression bonding, screen printing and laser cutting. Finite element analysis (FEA) and experimental results showed that using low modulus brass instead of stainless steel as the PEH substrate enhances the voltage output of the device, and the hollow design greatly increases the overall stress level and power density. In addition, the developed PEH with a trapezoidal hole obtained the best output performance; when the acceleration, resonance frequency and matched load resistance were 0.5 g, 56.3 Hz and 114 kΩ, respectively, the peak voltage was 17 V and the power density was 2.52 mW/cm³. Meanwhile, compared with the unhollowed device, the peak voltage and maximum power density of the proposed PEH were increased by 30.7% and 24.4%, respectively, and the resonance frequency was reduced by 7%. This study verified the feasibility of the optimized design through simulation and experimental comparison.

To achieve better structural accuracy and aspect ratio, nano-gratings with a vertical angle close to 90° and a depth-to-width ratio of about 8 were prepared by synchrotron radiation. The optimal exposure dose and development time were determined to be 0.006 (A·h) and 6 min, respectively, by observing the surface loss and roughness of the gratings with slit widths of 150 nm and 250 nm under different conditions. To obtain the desired rectangular grating structure, the experimental conditions were optimized with the help of controlled variables experimental method. With the mask-to-photoresist pitch and the development and drying temperatures of 20 μ m and 23 °C, the optimized depth-to-width ratio of the nano-gratings with a slit width of 250 nm can reach 8.28. The cone angle can reach 88.4°. The aspect ratio of the nano-gratings with a slit width of 150 nm is 7.18, and its cone angle is 87.1°.