Wearable and implantable BioMEMSs (biomedical microelectromechanical systems) have transformed modern healthcare by enabling continuous, personalized, and minimally invasive monitoring, diagnostics, and therapy. Wearable BioMEMSs have advanced rapidly, encompassing a diverse range of biosensors, bioelectronic systems, drug delivery platforms, and motion tracking technologies. These devices enable non-invasive, real-time monitoring of biochemical, electrophysiological, and biomechanical signals, offering personalized and proactive healthcare solutions. In parallel, implantable BioMEMS have significantly enhanced long-term diagnostics, targeted drug delivery, and neurostimulation. From continuous glucose and intraocular pressure monitoring to programmable drug delivery and bioelectric implants for neuromodulation, these devices are improving precision treatment by continuous monitoring and localized therapy. This review explores the materials and technologies driving advancements in wearable and implantable BioMEMSs, focusing on their impact on chronic disease management, cardiology, respiratory care, and glaucoma treatment. We also highlight their integration with artificial intelligence (AI) and the Internet of Things (IoT), paving the way for smarter, data-driven healthcare solutions. Despite their potential, BioMEMSs face challenges such as regulatory complexities, global standardization, and societal determinants. Looking ahead, we explore emerging directions like multifunctional systems, biodegradable power sources, and next-generation point-of-care diagnostics. Collectively, these advancements position BioMEMS as pivotal enablers of future patient-centric healthcare systems.

Lithography is crucial to semiconductor manufacturing, enabling the production of smaller, more powerful electronic devices. This review explores the evolution, principles, and advancements of key lithography techniques, including extreme ultraviolet (EUV) lithography, electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL), and nanoimprint lithography (NIL). Each method is analyzed based on its working principles, resolution, resist materials, and applications. EUV lithography, with sub-10 nm resolution, is vital for extending Moore’s Law, leveraging high-NA optics and chemically amplified resists. EBL and IBL enable high-precision maskless patterning for prototyping but suffer from low throughput. XRL, using synchrotron radiation, achieves deep, high-resolution features, while NIL provides a cost-effective, high-throughput method for replicating nanostructures. Alignment marks play a key role in precise layer-to-layer registration, with innovations enhancing accuracy in advanced systems. The mask fabrication process is also examined, highlighting materials like molybdenum silicide for EUV and defect mitigation strategies such as automated inspection and repair. Despite challenges in resolution, defect control, and material innovation, lithography remains indispensable in semiconductor scaling, supporting applications in integrated circuits, photonics, and MEMS/NEMS devices. Various molecular strategies, mechanisms, and molecular dynamic simulations to overcome the fundamental lithographic limits are also highlighted in detail. This review offers insights into lithography’s present and future, aiding researchers in nanoscale manufacturing advancements.

Two-photon polymerization (2PP) is revolutionizing micro- and nanoscale manufacturing by enabling true 3D fabrication with feature sizes far below the diffraction limit—capabilities that traditional lithography cannot match. By using ultrafast femtosecond laser pulses and nonlinear absorption, 2PP initiates polymerization only at the laser’s focal point, offering unmatched spatial precision. This paper highlights key advancements driving the field forward: the development of new materials engineered for 2PP with improved sensitivity, mechanical strength, and the introduction of high-speed, parallelized fabrication strategies that significantly enhance throughput. These innovations are shifting 2PP from a prototyping tool to a viable method for scalable production. Applications now range from custom biomedical scaffolds to complex photonic and metamaterial structures, demonstrating their growing real-world impact. We also address persistent challenges—including slow writing speeds and limited material options—and explore future directions to overcome these barriers. With continued progress in materials and hardware, 2PP is well positioned to become a cornerstone of next-generation additive manufacturing.