Yue ming LI

Ms. Yue ming LI

orcid

Research Focus & Metrics

Academic Career Length

5Years (2022-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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17 June 2024 in Talanta
Verified
Journal Article
Closed access
XKXinyu Kong
Xinyu Kong
YLYue ming LI
Yue ming LI
WXWei Xiao
Wei Xiao
YLYongxin Li
Yongxin Li
ZLZewei Luo
Zewei Luo
YDYixiang Duan
Yixiang Duan

8 November 2023 in Signal, Image and Video Processing
Verified
Journal Article
Closed access
PDF file
DLDongjie Li
Dongjie Li
YLYue ming LI
Yue ming LI
YLYang Liu
Yang Liu
XWXueying Wang
Xueying Wang
FZFuyue Zhang
Fuyue Zhang
YLYu Liang
Yu Liang

3 October 2022 in Stem Cells
Verified
Journal Article
Closed access
PDF file
Fenggang YuFenggang Yu
Fenggang Yu
FLFei Liu
Fei Liu
XLxiaohua liang
xiaohua liang
LDLinwei Duan
Linwei Duan
QLQiongqiong Li
Qiongqiong Li
XZXuening Zhao
Xuening Zhao
Induced pluripotent stem cells (iPSCs) generated from somatic cell sources are pluripotent and capable of indefinite expansion in vitro. They provide an unlimited source of cells that can be differentiated into lung progenitor cells for the potential clinical use in pulmonary regenerative medicine. This review gives a comprehensive overview on recent progress toward the use of iPSCs to generate proximal and distal airway epithelial cells and mix lung organoids. Further, their potential applications and future challenges for the field are discussed, with a focus on the technological hurdles that must be cleared before stem cell therapeutics could be used for clinical treatment.

27 April 2025 in Micromachines
Verified
Journal Article
Open access
PDF file
YLYue ming LI
Yue ming LI
ZQZhaofeng Qiu
Zhaofeng Qiu
TLTianci Li
Tianci Li
YKYi Kang
Yi Kang
SLShan Lu
Shan Lu
Xiarong HuXiarong Hu
Xiarong Hu
This paper proposes a 1200V 4H-SiC MOSFET incorporating a High-K dielectric-integrated fused source-gate (HKSG) structure, engineered to concurrently enhance the third-quadrant operation and high-frequency figure of merit (HF-FOM). The High-K dielectric enhances the electric field effect, reducing the threshold voltage of the source-gate. As a result, the reverse conduction voltage drops from 2.79 V (body diode) to 1.53 V, and the bipolar degradation is eliminated. Moreover, by incorporating a shielding area within the merged source-gate architecture, the gate-to-drain capacitance Cgd of the HKSG-MOS is reduced. The simulation results show that the HF-FOM Cgd × Ron,sp and Qgd × Ron,sp of the HKSG-MOS are decreased by 48.1% and 58.9%, respectively, compared with that of conventional SiC MOSFET. The improved performances make the proposed SiC MOSFEET have great potential in high-frequency power applications.

1 January 2022
Verified
Book Chapter
Closed access
PDF file
FSFang Shao
Fang Shao
RGRongqiang Guan
Rongqiang Guan
YLYue ming LI
Yue ming LI
JYJingjing Yan
Jingjing Yan