Aggregation of amyloid β (Aβ) peptide is implicated in fatal Alzheimer's disease, for which no cure is available. Understanding the mechanisms responsible for this aggregation is required in order for therapies to be developed. In an effort to better understand the molecular mechanisms involved in spontaneous aggregation of Aβ peptide, extensive molecular dynamics simulations are reported, and the results are analyzed through a combination of structural biology tools and a novel essential collective dynamics method. Several model systems composed of ten or twelve Aβ_17–42 chains in water are investigated, and the influence of metal ions is probed. The results suggest that Aβ monomers tend to aggregate into stable globular-like oligomers with 13–23% of β-sheet content. Two stages of oligomer formation have been identified: quick collapse within the first 40 ns of the simulation, characterized by a decrease in inter-chain separation and build-up of β-sheets, and the subsequent slow relaxation of the oligomer structure. The resulting oligomers comprise a stable, coherently moving sub-aggregate of 6–9 strongly inter-correlated chains. Cu²⁺ and Fe²⁺ ions have been found to develop coordination bonds with carboxylate groups of E22, D23 and A42, which remain stable during 200 ns simulations. The presence of Fe²⁺, and particularly Cu²⁺ ions, in negatively charged cavities has been found to cause significant changes in the structure and dynamics of the oligomers. The results indicate, in particular, that formation of non-fibrillar oligomers might be involved in early template-free aggregation of Aβ_17–42 monomers, with charged species such as Cu²⁺ or Fe²⁺ ions playing an important role.

ZEP brand electron beam resists are well-known for their high sensitivity and etch durability. The various performance metrics such as sensitivity, contrast, and resolution of ZEP resist depend strongly on the development process. In this work, we investigate the development of ZEP-520 resist through contrast curves, dense gratings, and surface roughness measurements using three different classes of developer systems of varying solvation strength, ZED-N50, methyl isobutyl ketone (MIBK) : isopropyl alcohol (IPA) 1:3, and IPA : H₂O 7:3, at the ambient temperature (22 °C) and cold (-15 °C) development conditions. In order to provide a deeper insight into the ZEP development process, we propose a novel kinetic model of dissolution for ZEP, and develop an efficient analytical method that allows determining the microscopic parameters of ZEP dissolution based on experimental contrast curves. We also observe experimentally and characterize the negative tone behavior of ZEP for dense grating patterning and compare its performance with positive tone behavior.

As a low cost and high throughput method for nanoscale pattern replication, step and flash imprint lithography (SFIL) with UV transparent masters is gaining prominence for its potential in photonics and integrated-circuit fabrication. However, dielectric materials appropriate for fabricating nanostructured SFIL masters present a challenge when employing electron beam lithography (EBL) because insulator substrates covered by polymeric resists such as PMMA tend to accumulate charge during EBL exposures, thereby degrading the process. In this work we explore the performance of four different EBL anticharging schemes for nanofabrication of dense arrays of dots having diameters 16–30 nm in PMMA on UV transparent fused silica (FS) substrates. These include overlayers of aluminum or a water-soluble conducting polymer, as well as sandwiching of Al or Cr thin films between the substrate and PMMA. The quality of patterns transferred from PMMA into the underlying metallic layers was analyzed, and the grain size of the metal was found to be the limiting factor determining the edge roughness. The best resolution was attained employing the conducting polymer top-coating. This scheme also involves fewer processing steps. The authors have used this technique for lift-off of Cr and Au as well as Cr masked etch transfer of nanosized patterns into glass substrates for UV-transparent master mold fabrication.