Ejection of macroparticles is an inherent and unavoidable characteristic of cold cathode arc discharges. The size of the cathode arc spot's melt pool is closely related to the emitted particle size, and existing studies mostly indicate that motion velocity of arc spots can be heightened primarily by magnetic fields, thereby reducing the ejection of macroparticles. However, scant consideration has been given to avoid the fundamental nature of arc spot current concentration discharge by exploring the phenomenon of arc spot splitting. In this paper, microspot splitting characteristics of direct current and pulsed cathodic vacuum arc were compared and analyzed to investigate the effect of pulsed discharges on the arc spot's internal structure, splitting, and kinematic characteristics. The results showed that pulsed arc discharges emit a dense, highly ionized plasma flow which impacts the relatively thin positive charge layer instantaneously during the peak pulsed period. This then produces a highly ionized plasma region, while also promoting an effect by which the arc spot is split into multiple microspots. Additionally, the degree of dispersion resulting from microspot splitting is positively correlated with the ratio of the plasma flow density to the concentration of the positive charge layer at the moment of microexplosion. Therefore, the microspot splitting effect of a second-order pulsed arc is weaker than that of a first-order pulsed arc. Moreover, the splitting characteristics indicated a trend toward the progressive splitting state of the direct current cathode arc. When the peak current of the single-order pulsed arc was increased from 100 to 400 A, the particle refinement effect on the surface of the CrN coating became much more evident compared to the effect of a 200 A arc in the direct current mode. And upon reaching a peak current of 500 A (and up to 600 A), the number of splits did not increase linearly due to the continuous increase in the discrete degree of microspot splitting and concurrent decrease in microspot stability. This resulted in relatively high individual microspot currents, while some relative macroparticles still appeared on the coating surface.

Aiming at the goal of preparing high-quality coatings, this paper reviews the progress on circular arc source structure and magnetic field arc controlling technology in arc ion plating (AIP), with a focus on design characteristics of the different structures and configuration optimization of the corresponding magnetic fields. The circular arc source, due to its simple structure, convenient installation, flexible target combination, high cooling efficiency, and high ionization rate and deposition rate, has shown significant application potential in AIP technology. In terms of magnetic field arc controlling technology, this paper delves into the design progress of various magnetic field configurations, including fixed magnetic fields generated by permanent magnets, dynamic rotating magnetic fields, axially symmetric magnetic fields, rotating transverse magnetic fields, and multi-mode alternating electromagnetic coupling fields. By designing the magnetic field distribution reasonably, the trajectory and velocity of the arc spot can be controlled precisely, thus reducing the generation of macroparticles, improving target utilization, and enhancing coating uniformity. In particular, the introduction of multi-mode magnetic field coupling technology has broken through the limitations of traditional single magnetic field structures, achieving comprehensive optimization of arc spot motion and plasma transport. Hopefully, these research advances provide an important theoretical basis and technical support for the application of AIP technology in the preparation for high-quality decorative and functional coatings.

This paper presents an experimental study on the spot splitting behavior of aluminum, titanium, and their alloy cathodes during electric arc discharge. Utilizing high-speed digital cameras, we dynamically captured the splitting motion of cathode arc spots and analyzed their behavior under different pressures of argon, nitrogen, and oxygen. The study also examined the effects of pulsed arc current parameters on spot splitting. We observed a ringlike expansion of pulsed arc spots during splitting, with aluminum cathodes showing better performance than titanium in promoting spot splitting and stabilizing the subsequent motion of the split spots. Oxygen was found to enhance spot splitting more effectively than nitrogen. Furthermore, the parameters of the pulsed arc can control the extent of spot splitting and expansion. These findings provide valuable insights for optimizing arc parameter control in metal film deposition processes.

The proper control of cathode spot motion is the key issue in the application of vacuum arc deposition (VAD). Improving the arc spot discharge requires considering the structure and properties of the deposited films/coatings as well as the deposition velocity, target utilization, etc. To achieve this goal, it is necessary to precisely observe cathode spots during discharge at both microscopic and macroscopic scales. However, how to capture the motion and splitting behavior of cathode spots using simple equipment remains an open question. In this work, we analyze the motion and the splitting behavior of cathode spots considering industry application on a Cr target for VAD under arc currents in the direct mode (70 A, 100 A, 150 A 200 A) and 400 A as a peak value in the pulse mode with two applied magnetic fields (20 Gs and 40 Gs) at the macroscopic scale using a high-speed digital camera, employing different exposure times under an extracted interval of 1 ms ranging from 0.01 ms to 20 ms. Furthermore, the images are also compared when the interval is extended to 2 ms and 4 ms. Considering all factors in the available data, 0.05 ms is suggested as the best exposure time, and 1 ms is suggested as the most suitable extracted interval for cathode spot observation under these conditions. Hopefully, this paper provides a suitable technique for observing the motion and splitting behavior of cathode spots at a macroscopic scale with the purpose of suppressing/eliminating the injection of macroparticles at the source for industrial VAD coating products of high quality.

High-entropy nitride coatings exhibit great potential for extreme service conditions owing to their outstanding hardness, wear resistance and thermal stability. In this work, high-hardness and wear-resistant (AlCrZrTiNb)Nₓ high-entropy alloy (HEA) nitride coatings were deposited by inductively coupled plasma (ICP)-assisted magnetron sputtering. Six different N2/Ar gas flow ratios (0:1, 1:2, 3:4, 1:1, 5:4 and 3:2) were adopted as the key variable to systematically investigate their influences on deposition rate, elemental composition, phase evolution, cross-sectional microstructure and mechanical performance of the coatings. Results show that the nitrogen addition changes the structure from amorphous/BCC metallic alloy to homogeneous FCC solid-solution nitride and refines grains. Strong metal–nitrogen bonding inhibits the precipitation of intermetallic compounds. Coating hardness and wear resistance first increase and then decrease with rising N2/Ar ratio. The optimal performance is obtained at an N2/Ar ratio of 3:4, where the coating reaches a hardness of 28.59 GPa together with excellent wear resistance. Excessive nitrogen aggravates target poisoning, causes Al depletion and CrN enrichment, and degrades the comprehensive properties. This work proves that the N2/Ar ratio is a key parameter for microstructure regulation, and ICP sputtering is suitable for fabricating high-performance wear-resistant high-entropy nitride coatings.