Katarzyna Kwiecień

Ms. Katarzyna Kwiecień

orcid

Research Focus & Metrics

Academic Career Length

5Years (2022-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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1 February 2025 in Applied Surface Science
Verified
Journal Article
Closed access
KKKatarzyna Kwiecień
Katarzyna Kwiecień
JRJan Raczyński
Jan Raczyński
APAgnieszka Puchalska
Agnieszka Puchalska
ENEwelina Nowak
Ewelina Nowak
ECEdyta Chłopocka
Edyta Chłopocka
WKWojciech Koczorowski
Wojciech Koczorowski

16 September 2022 in Surface Science
Verified
Journal Article
Closed access
KKKatarzyna Kwiecień
Katarzyna Kwiecień
WKWojciech Koczorowski
Wojciech Koczorowski
TGT. Grzela
T. Grzela

24 January 2026 in Physchem
Verified
Journal Article
Open access
PDF file
PKPiotr Kałuziak
Piotr Kałuziak
JRJan Raczyński
Jan Raczyński
SESemir El-Ahmar
Semir El-Ahmar
KKKatarzyna Kwiecień
Katarzyna Kwiecień
MPMarta Przychodnia
Marta Przychodnia
WKWojciech Koczorowski
Wojciech Koczorowski
Studies on two-dimensional materials (such as topological insulators or transition metal dichalcogenides) have shown that they exhibit unique properties, including high charge carrier mobility and tunable bandgaps, making them attractive for next-generation electronics. Some of these materials (e.g., HfSe2) also offer thickness-dependent bandgap engineering. However, the standard device fabrication techniques often introduce processing contamination, which reduces device efficiency. In this paper, we present a modified mechanical exfoliation technique, the Reversed Structuring Procedure, which enables the fabrication of hybrid systems based on 2D microflakes with improved interface cleanness and contact quality. Hall effect measurements on Bi2Se3 and HfSe2 devices confirm enhanced electrical performance, including the decrease in the measured total resistance. We also introduce a novel Star-Shaped Electrode Structure, which allows for accurate Hall measurements and the exploration of geometric magnetoresistance effects within the same device. This dual-purpose geometry enhances the flexibility and demonstrates broader functionality of the proposed fabrication method. The presented results validate the Reversed Structuring Procedure method as a robust and versatile approach for laboratory test-platforms for electronic applications of new types of layered materials whose fabrication technology is not yet compatible with CMOS.

28 July 2025 in Preprints.org
Verified
Preprint
Open access
PDF file
PKPiotr Kałuziak
Piotr Kałuziak
JRJan Raczyński
Jan Raczyński
SESemir El-Ahmar
Semir El-Ahmar
KKKatarzyna Kwiecień
Katarzyna Kwiecień
MPMarta Przychodnia
Marta Przychodnia
WKWojciech Koczorowski
Wojciech Koczorowski
Studies on two-dimensional materials (such as topological insulators or transition metal dichalcogenides) have shown that they exhibit unique properties, including high charge carrier mobility and tunable bandgaps, making them attractive for next-generation electronics. Some of these materials (e.g., HfSe2) also offer thickness-dependent bandgap engineering. However, the standard device fabrication techniques often introduce processing contamination, which reduces device efficiency. In this paper, we present a modified mechanical exfoliation technique, the Reversed Structuring Procedure, which enables the fabrication of hybrid systems based on 2D micro-flakes with improved interface cleanliness and contact quality. Hall effect measurements on Bi2Se3 and HfSe2 devices confirm enhanced electrical performance, including increased carrier mobility. We also introduce a novel Star-Shaped Electrode Structure, which allows for accurate Hall measurements and the exploration of geometric magnetoresistance effects within the same device. This dual-purpose geometry enhances the flexibility and demonstrates broader functionality of the proposed fabrication method. The presented results validate the Reversed Structuring Procedure method as a robust and versatile approach for 2D material-based electronic and sensing applications.