Plasma alloying technique capable of producing metallic coatings with metallurgical bonding has attracted much attention in dental and orthopedic fields. In this study, the effects of temperature and time of plasma tantalum (Ta) alloying technique on the mechanical, electrochemical, and osteoblastic properties of Ta coatings were systematically investigated. Ta coatings prepared at 800 °C possess better interfacial strengths than those prepared at 750 and 850 °C, and the interfacial strength increases with prolonged alloying time (30–120 min). At 800 °C, however, the increased proportion of the soft Ta deposition layer with alloying time in the whole coating impairs the surface mechanical properties of the entire coating, as convinced by decreased microhardness and wear resistance. Moreover, Ta coatings exhibit better corrosion resistance than the Ti6Al4V substrate in Dulbecco’s modified Eagle medium. The enhanced adhesion and extracellular matrix mineralization level of osteoblasts demonstrate the better cytocompatibility and osteogenic activity of the Ta coating. Ta30 (Ta coating prepared at 800 °C for 30 min) exhibits excellent mechanical, electrochemical, and osteoblastic behaviors and is promising in biomedical applications.
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4 August 2016 in Journal of Physics D: Applied Physics
63 mm diameter polycrystalline diamond (PCD) films were synthesized via a microwave plasma chemical vapor deposition (MPCVD) reactor in 99% H 2 –1% CH 4 atmosphere. Two different conditions, i.e. the typical condition (input power of 5 kW and gas pressure of 13 kPa) and the high power density condition (input power of 10 kW and gas pressure of 18 kPa), were employed for diamond depositions. The color changes of the plasma under the two proposed conditions with and without methane were observed by photographs. Likewise, the concentrations of hydrogen atoms and carbon active chemical species in plasma were analyzed by optical emission spectroscopy (OES). The morphologies and purity of the PCD films were investigated by scanning electron microscopy (SEM) and Raman spectroscopy, respectively. Finally, the transmission spectrum of the polished PCD plates was characterized by a UV–Vis–NIR spectrometer. Experimental results showed that both the concentrations of hydrogen atoms and carbon radicals increased obviously, with the boost input power and higher pressure. The films synthesized under the high power density condition displayed higher purity and more uniform thickness. The growth rates in 10 kW and 18 kPa reached ~7.7 µ m h −1 , approximately 6.5 times as much as that occurred in the typical process. Moreover, the polished plates synthesized under the high power density condition possessed a relatively high optical transmittance (~69%), approaching the theoretical values of approximately 71.4% in IR. These results indicate that the purity and growth rate of big-area PCD films could be simultaneously increased with power density.