Seung-Woo Kim

Prof. Dr. Seung-Woo Kim

Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Korea
orcid

Research Focus & Metrics

Academic Career Length

40Years (1987-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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1 June 2008 in Nature
Verified
Journal Article
Closed access
Seungchul KimSeungchul Kim
Seungchul Kim
JJJonghan Jin
Jonghan Jin
Young-Jin KIMYoung-Jin KIM
Young-Jin KIM
IPIn-Yong Park
In-Yong Park
YKYunseok Kim
Yunseok Kim
Seung-Woo KimSeung-Woo Kim
Seung-Woo Kim

1 January 2015 in CIRP Annals
Verified
Journal Article
Closed access
Wei GaoWei Gao
Wei Gao
Seung-Woo KimSeung-Woo Kim
Seung-Woo Kim
HBH. Bosse
H. Bosse
Han HaitjemaHan Haitjema
Han Haitjema
YCY.L. Chen
Y.L. Chen
HKH. Kunzmann
H. Kunzmann

8 August 2010 in Nature Photonics
Verified
Journal Article
Closed access
JLJoohyung Lee
Joohyung Lee
Young-Jin KIMYoung-Jin KIM
Young-Jin KIM
KLKeunwoo Lee
Keunwoo Lee
SLSanghyun Lee
Sanghyun Lee
Seung-Woo KimSeung-Woo Kim
Seung-Woo Kim

16 October 2011 in Nature Photonics
Verified
Journal Article
Closed access
IPI. Park
I. Park
Seung-Woo KimSeung-Woo Kim
Seung-Woo Kim
JCJ. Choi
J. Choi
DLD. Lee
D. Lee
Young-Jin KIMYoung-Jin KIM
Young-Jin KIM
MSM. Stockman
M. Stockman

1 January 2006 in Optics Express
Verified
Journal Article
Closed access
PDF file
KJKi-Nam Joo
Ki-Nam Joo
Seung-Woo KimSeung-Woo Kim
Seung-Woo Kim
We describe an interferometric method that enables to measure the optical path delay between two consecutive femtosecond laser pulses by way of dispersive interferometry. This method allows a femtosecond laser to be utilized as a source of performing absolute distance measurements to unprecedented precision over extensive ranges. Our test result demonstrates a non-ambiguity range of ~1.46 mm with a resolution of 7 nm over a maximum distance reaching ~0.89 m.

1 October 1999 in Applied Optics
Verified
Journal Article
Closed access
PDF file
Seung-Woo KimSeung-Woo Kim
Seung-Woo Kim
GKGee-Hong Kim
Gee-Hong Kim
White-light scanning interferometry is increasingly used for precision profile metrology of engineering surfaces, but its current applications are limited primarily to opaque surfaces with relatively simple optical reflection behavior. A new attempt is made to extend the interferometric method to the thickness-profile measurement of transparent thin-film layers. An extensive frequency-domain analysis of multiple reflection is performed to allow both the top and the bottom interfaces of a thin-film layer to be measured independently at the same time by the nonlinear least-squares technique. This rigorous approach provides not only point-by-point thickness probing but also complete volumetric film profiles digitized in three dimensions.