The parameter sets used during the selective laser melting (SLM) process directly affect the final product through the resulting melt-pool temperature. Achieving the optimum set of parameters is usually done experimentally, which is a costly and time-consuming process. Additionally, controlling the deviation of the melt-pool temperature from the specified value during the process ensures that the final product has a homogeneous microstructure. This study proposes a multiphysics numerical model that explores the factors affecting the production of parts in the SLM process and the mathematical relationships between them, using stainless steel 316L powder. The effect of laser power and laser spot diameter on the temperature of the melt-pool at different scanning velocities were studied. Thus, mathematical expressions were obtained to relate process parameters to melt-pool temperature. The resulting mathematical relationships are the basic elements to design a controller to instantly control the melt-pool temperature during the process. In the study, test samples were produced using simulated parameters to validate the simulation approach. Samples produced using simulated parameter sets resulting in temperatures of $2000\left(\mathrm{K}\right)$ and above had acceptable microstructures. Evaporation defects caused by extreme temperatures, unmelted powder defects due to insufficient temperature, and homogenous microstructures for suitable parameter sets predicted by the simulations were obtained in the experimental results, and the model was validated.

TiO₂ thin films are used extensively for a broad range of applications including environmental remediation, self-cleaning technologies (windows, building exteriors, and textiles), water splitting, antibacterial, and biomedical surfaces. While a broad range of methods such as wet-chemical synthesis techniques, chemical vapor deposition (CVD), and physical vapor deposition (PVD) have been developed for preparation of TiO₂ thin films, PVD techniques allow a good control of the homogeneity and thickness as well as provide a good film adhesion. On the other hand, the choice of the PVD technique enormously influences the photocatalytic performance of the TiO₂ layer to be deposited. Three important parameters play an important role on the photocatalytic performance of TiO₂ thin films: first, the different pathways in crystallization (nucleation and growth); second, anatase/rutile formation; and third, surface area at the interface to the reactants. This study aims to provide a review regarding some strategies developed by our research group in recent years to improve the photocatalytic performance of TiO₂ thin films. An innovative approach, which uses thermally induced nanocrack networks as an effective tool to enhance the photocatalytic performance of sputter deposited TiO₂ thin films, is presented. Plasmonic and non-plasmonic enhancement of photocatalytic performance by decorating TiO₂ thin films with metallic nanostructures are also briefly discussed by case studies. In addition to remediation applications, a new approach, which utilizes highly active photocatalytic TiO₂ thin film for micro- and nanostructuring, is also presented.