We demonstrate theoretically the enhancement of the four first-order magneto-optical effects using an all-dielectric 1D resonant grating. The modeled structure was designed for the Faraday effect at normal incidence at a wavelength of 1.55 µ m for which the calculated improvement is shown to be one hundred times the off-resonance values. At 1° incidence, polar and longitudinal Kerr effects were also improved, showing polarization rotations up to 14°. For the same incidence conditions, transverse magneto optical Kerr effect was also improved, leading to a reflectance difference of 12% for a reflectance intensity of 40%. These results are interesting for the development of magnetic-field sensors capable of detecting of several components of the field.

Zirconium oxide (ZrO₂) is a well-studied and promising material due to its remarkable chemical and physical properties. It is used, for example, in coatings for corrosion protection layer, wear and oxidation, in optical applications (mirror, filters), for decorative components, for anti-counterfeiting solutions and for medical applications. ZrO₂ can be obtained as a thin film using different deposition methods such as physical vapor deposition (PVD) or chemical vapor deposition (CVD). These techniques are mastered but they do not allow easy micro-nanostructuring of these coatings due to the intrinsic properties (high melting point, mechanical and chemical resistance). An alternative approach described in this paper is the sol-gel method, which allows direct micro-nanostructuring of the ZrO₂ layers without physical or chemical etching processes, using optical or nano-imprint lithography. In this paper, the authors present a complete and suitable ZrO₂ sol-gel method allowing to achieve complex micro-nanostructures by optical or nano-imprint lithography on substrates of different nature and shape (especially non-planar and foil-based substrates). The synthesis of the ZrO₂ sol-gel is presented as well as the micro-nanostructuring process by masking, colloidal lithography and nano-imprint lithography on glass and plastic substrates as well as on plane and curved substrates.

The beneficial combination of micro- and nano-patterned surfaces with magneto-optical materials was investigated over the recent years. Due to their resonant behavior, these structures are commonly used to enhance the non-reciprocal magneto-optical effects. In this paper, a novel kind of magneto-optical intensity effect is enhanced with an all-dielectric grating patterned on a magnetic nanocomposite layer. This nanocomposite is made of CoFe₂O₄ nanoparticles (NPs) embedded in a silica matrix by sol–gel technique. The demonstrated magneto-optical intensity effect is reciprocal and it is observed with transverse magnetic field, for both polarization (TE and TM) and small angles of incidence. Such effect is not explained by the classical appearance of off-diagonal elements in the permittivity tensor of the magneto-optical material under magnetic field. However, it can be attributed to a magneto-induced reciprocal modification of the diagonal elements. Furthermore, this effect strongly depends on the NPs orientation inside the magneto-optical film and can originate from the magnetostrictive property of the magnetic CoFe₂O₄ NPs.

We demonstrate a novel method for fabricating densely packed, high-aspect-ratio cavities (depth to diameter ratio > 1) in silicon wafers coated with diamond-like carbon (DLC). The process combines femtosecond laser irradiation with subsequent wet etch (potassium hydroxide-based) or plasma etch (chlorine- and oxygen-based). The femtosecond laser is used to pattern precise openings in the DLC layer, exposing the underlying silicon, which is then rapidly etched to form well-defined cavities. This combined laser ablation and etching approach enables high-throughput fabrication of densely packed micrometer cavities and offers scalability toward industrial production. The resulting hybrid DLC-coated silicon structure, featuring densely packed cavities, may exhibit antireflective properties in the far-infrared spectrum range.