Hiroshi Inokawa

Prof. Dr. Hiroshi Inokawa

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Research Focus & Metrics

Academic Career Length

45Years (1982-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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1 October 2019 in Applied Catalysis B: Environment and Energy
Verified
Journal Article
Closed access
SBSaikat Bolar
Saikat Bolar
Subhasis ShitSubhasis Shit
Subhasis Shit
JKJ. Sharath Kumar
J. Sharath Kumar
NMNaresh Chandra Murmu
Naresh Chandra Murmu
RGR. Sankar Ganesh
R. Sankar Ganesh
TKTapas Kuila
Tapas Kuila

15 November 1984 in Journal of Applied Physics
Verified
Journal Article
Closed access
PDF file
IYI. Yamada
I. Yamada
HIHiroshi Inokawa
Hiroshi Inokawa
TTT. Takagi
T. Takagi
Epitaxial Al films were deposited on clean Si(111) and Si(100) by ionized-cluster beam at room temperature. Crystalline orientation was studied by reflection electron diffraction during and after the deposition of the 360-nm-thick Al films. Ion channeling spectra, optical reflectance spectra, and scanning electron micrographs were taken to evaluate the properties of the deposited films and to elucidate the effects of acceleration of ionized clusters. It was found that the films did not give rise to hillock and alloy penetration at the interface after 450 °C thermal treatment.

15 January 2007 in Applied Physics Letters
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Journal Article
Closed access
TTTakasumi Tanabe
Takasumi Tanabe
KNKatsuhiko Nishiguchi
Katsuhiko Nishiguchi
ASAkihiko Shinya
Akihiko Shinya
EKEiichi Kuramochi
Eiichi Kuramochi
HIHiroshi Inokawa
Hiroshi Inokawa
SISeiichi Itabashi
Seiichi Itabashi
On-chip all-optical switching based on the carrier plasma dispersion in an argon ion (Ar+) implanted photonic crystal (PhC) nanocavity that is connected to input/output waveguides is described. A high dose of Ar+ is introduced, and annealing is used to recrystallize the silicon and thus create dislocation loops at the center of the PhC slab. Dislocation loops enable the fast recombination of the carriers, which allows a fast switching recovery time for PhC switches. The switching window (∼70ps) is three times smaller than that without ion implantation, while the required operating energy remains almost the same (<100fJ).

21 February 2008 in Physical Review B
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Journal Article
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HLH. W. Liu
H. W. Liu
TFT. Fujisawa
T. Fujisawa
YOY. Ono
Y. Ono
HIHiroshi Inokawa
Hiroshi Inokawa
AFA. Fujiwara
A. Fujiwara
YHY. Hirayama
Y. Hirayama
We present measurements of resonant tunneling through discrete energy levels of a silicon double quantum dot formed in a thin silicon-on-insulator layer. In the absence of piezoelectric phonon coupling, spontaneous phonon emission with deformation-potential coupling accounts for inelastic tunneling through the ground states of the two dots. Such transport measurements enable us to observe a Pauli spin blockade due to effective two-electron spin-triplet correlations, evident in a distinct bias-polarity dependence of resonant tunneling through the ground states. The blockade is lifted by the excited-state resonance by virtue of efficient phonon emission between the ground states. Our experiment demonstrates considerable potential for investigating silicon-based spin dynamics and spin-based quantum information processing.

30 January 2006 in Applied Physics Letters
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Journal Article
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AFAkira Fujiwara
Akira Fujiwara
HIHiroshi Inokawa
Hiroshi Inokawa
KYKenji Yamazaki
Kenji Yamazaki
HNHideo Namatsu
Hideo Namatsu
YTYasuo Takahashi
Yasuo Takahashi
SMStuart B. Martin
Stuart B. Martin
We have achieved the operation of single-electron tunneling (SET) transistors with gate-induced electrostatic barriers using silicon nanowire metal-oxide-semiconductor field-effect transistor (MOSFET) structures. The conductance of tunnel barriers is tunable by more than three orders of magnitude. By using the flexible control of the tunable barriers, the systematic evolution from a single charge island to double islands was clearly observed. We obtained excellent reproducibility in the gate capacitances: values on the order of 10 aF, with the variation smaller than 1 aF. This flexibility and controllability both demonstrate that the device is highly designable to build a variety of SET devices based on complementary metal-oxide-semiconductor technology.

1 November 2019 in Composites Part B: Engineering
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Journal Article
Closed access
SGSouvik Ghosh
Souvik Ghosh
JKJ. Sharath Kumar
J. Sharath Kumar
NMNaresh Chandra Murmu
Naresh Chandra Murmu
RGR. Sankar Ganesh
R. Sankar Ganesh
HIHiroshi Inokawa
Hiroshi Inokawa
TKTapas Kuila
Tapas Kuila