Michal Cichomski

Prof. Michal Cichomski

University of Lodz, Faculty of Chemistry, Department of Materials Technology and Chemistry, Lodz, Poland
orcid

Research Focus & Metrics

Academic Career Length

24Years (2003-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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1 January 2013 in Journal of Nanomaterials
Verified
Journal Article
Open access
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ETEmilia Tomaszewska
Emilia Tomaszewska
KRKatarzyna Ranoszek-Soliwoda
Katarzyna Ranoszek-Soliwoda
KKKinga Kadziola
Kinga Kadziola
BTBeata Tkacz-Szczęsna
Beata Tkacz-Szczęsna
GCGrzegorz Celichowski
Grzegorz Celichowski
JGJarosław Grobelny
Jarosław Grobelny
Dynamic light scattering is a method that depends on the interaction of light with particles. This method can be used for measurements of narrow particle size distributions especially in the range of 2–500 nm. Sample polydispersity can distort the results, and we could not see the real populations of particles because big particles presented in the sample can screen smaller ones. Although the theory and mathematical basics of DLS technique are already well known, little has been done to determine its limits experimentally. The size and size distribution of artificially prepared polydisperse silver nanoparticles (NPs) colloids were studied using dynamic light scattering (DLS) and ultraviolet‐visible (UV‐Vis) spectroscopy. Polydisperse colloids were prepared based on the mixture of chemically synthesized monodisperse colloids well characterized by atomic force microscopy (AFM), transmission electron microscopy (TEM), DLS, and UV‐Vis spectroscopy. Analysis of the DLS results obtained for polydisperse colloids reveals that several percent of the volume content of bigger NPs could screen completely the presence of smaller ones. The presented results could be extremely important from nanoparticles metrology point of view and should help to understand experimental data especially for the one who works with DLS and/or UV‐Vis only.

5 May 2006 in The Journal of Chemical Physics
Verified
Journal Article
Closed access
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EHE. Hoque
E. Hoque
JDJ. A. DeRose
J. A. DeRose
PHP. Hoffmann
P. Hoffmann
HMH. J. Mathieu
H. J. Mathieu
Bharat BhushanBharat Bhushan
Bharat Bhushan
MCMichal Cichomski
Michal Cichomski
Substrates of aluminum (Al) deposited by physical vapor deposition onto Si substrates and then chemically reacted with perfluorodecylphosphonic acid (PFDP∕Al∕Si) , decylphosphonic acid (DP∕Al∕Si) , and octadecylphosphonic acid (ODP∕Al∕Si) were studied by x-ray photoelectron spectroscopy (XPS), contact angle measurements, atomic force microscopy (AFM), and friction force microscopy, a derivative of AFM, to characterize their surface chemical composition, roughness, and micro-/nanotribological properties. XPS analysis confirmed the presence of perfluorinated and nonperfluorinated alkylphosphonate molecules on the PFDP∕Al∕Si , DP∕Al∕Si , and ODP∕Al∕Si . The sessile drop static contact angle of pure water on PFDP∕Al∕Si was typically more than 130° and on DP∕Al∕Si and ODP∕Al∕Si typically more than 125° indicating that all phosphonic acid reacted Al∕Si samples were very hydrophobic. The surface roughness for PFDP∕Al∕Si , DP∕Al∕Si , ODP∕Al∕Si , and bare Al∕Si was approximately 35nm as determined by AFM. The surface energy for PFDP∕Al∕Si was determined to be approximately 11mN∕m by the Zisman plot method compared to 21 and 20mN∕m for DP∕Al∕Si and ODP∕Al∕Si , respectively. Tribology involves the measure of lateral forces due to friction and adhesion between two surfaces. Friction, adhesion, and wear play important roles in the performance of micro-/nanoelectromechanical systems. PFDP∕Al∕Si gave the lowest adhesion and coefficient of friction values while bare Al∕Si gave the highest. The adhesion and coefficient of friction values for DP∕Al∕Si and ODP∕Al∕Si were comparable.

5 March 2003 in Macromolecules
Verified
Journal Article
Closed access
Slawomir KadlubowskiSlawomir Kadlubowski
Slawomir Kadlubowski
JGJarosław Grobelny
Jarosław Grobelny
WOWielislaw Olejniczak
Wielislaw Olejniczak
MCMichal Cichomski
Michal Cichomski
PUPiotr Ulanski
Piotr Ulanski

7 April 2006 in Microsystem Technologies
Verified
Journal Article
Closed access
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Bharat BhushanBharat Bhushan
Bharat Bhushan
MCMichal Cichomski
Michal Cichomski
EHEnamul Hoque
Enamul Hoque
JDJames A. DeRose
James A. DeRose
PHPatrik Hoffmann
Patrik Hoffmann
HMHans J. Mathieu
Hans J. Mathieu

1 January 2011 in Acta Materialia
Verified
Journal Article
Closed access
WSWitold Szmaja
Witold Szmaja
JGJarosław Grobelny
Jarosław Grobelny
MCMichal Cichomski
Michal Cichomski
SHSatoshi Hirosawa
Satoshi Hirosawa
YSYasutaka Shigemoto
Yasutaka Shigemoto

1 March 2005 in Applied Surface Science
Verified
Journal Article
Closed access
Ireneusz PiwońskiIreneusz Piwoński
Ireneusz Piwoński
JGJarosław Grobelny
Jarosław Grobelny
MCMichal Cichomski
Michal Cichomski
GCG. Celichowski
G. Celichowski
JRJacek Rogowski
Jacek Rogowski