Jacek Rogowski completed his M.S in Technical Physics in 1982. In 1989, he joined the Institute of Radiation Chemistry at the Technical University of Lodz, where he obtained his Ph.D in Chemistry in 1995. He spent ten months working as a postdoctoral fellow at the Ohio State University in 1996. In 1999 he transferred to the Institute of General and Ecological Chemistry at the Technical University of Lodz to start work on the application of secondary-ion mass spectrometry (TOF-SIMS) in materials science, catalysis and environmental sciences. His current research interests focus on the study of metal-semiconductor interfaces and surfaces of supported catalysts using the TOF-SIMS technique.
Jacek Rogowski completed his M.S in Technical Physics in 1982. In 1989, he joined the Institute of Radiation Chemistry at the Technical University of Lodz, where he obtained his Ph.D in Chemistry in 1995. He spent ten months working as a postdoctoral fellow at the Ohio State University in 1996. In 1999 he transferred to the Institute of General and Ecological Chemistry at the Technical University of Lodz to start work on the application of secondary-ion mass spectrometry (TOF-SIMS) in materials science, catalysis and environmental sciences. His current research interests focus on the study of metal-semiconductor interfaces and surfaces of supported catalysts using the TOF-SIMS technique.