We demonstrate experimentally that Tamm plasmons in the near infrared can be supported by a dielectric mirror interfaced with a metasurface, a discontinuous thin metal film periodically patterned on the sub‐wavelength scale. More crucially, not only do Tamm plasmons survive the nanopatterning of the metal film but they also become sensitive to external perturbations as a result. In particular, by depositing a nematic liquid crystal on the outer side of the metasurface, we were able to red shift the spectral position of Tamm plasmon by 35 nm, while electrical switching of the liquid crystal enabled us to tune the wavelength of this notoriously inert excitation within a 10‐nm range.

We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50–250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ≈120° for the thickness of 50 nm to ≈100° for the thickness of 2300 nm. At the same time the surface free energy grows from ≈25 mJ/m2 for the thickness of 50 nm to ≈33 mJ/m2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.

The laser damage resistance of an optical element in high power laser systems depends significantly on the surface quality of the optical substrate. In this experiment, commercially polished fused silica substrates were etched in argon plasma generated by a RF source and their surface roughness, flatness and optical properties were investigated. This method can be applied in a vacuum chamber prior to deposition of the multilayer coatings without breaking the vacuum. It was shown that by etching the resistance to 355 nm, laser radiation could be improved more than 8 times. However, it strongly related with primary substrate quality. The etching depth from 100 nm suggests the optimum performance of surface quality in terms of surface low roughness, high flatness, and high laser damage threshold. These results are of significant importance for the manufacture of high quality laser optics on fused silica substrates. As an example of an application of our technology, anti-reflective and polarizing optical interference coatings were deposited on etched substrates and the increase of their resistance to laser radiation was measured.