Self-consistent optical constants of SiO₂ and Ta₂O₅ films have been obtained for their relevance in optical coatings from the near ultraviolet to the near infrared spectral ranges, where they are transparent and have a high refractive index contrast. Particular attention has been paid to wavelengths close to and shorter than each material cutoff. The far and the extreme ultraviolet ranges are also covered here, where few (SiO₂) or almost no optical constant data (Ta₂O₅) were available for films of these materials. This work is aimed at filling the lack of self-consistent sets of optical constants with data in a very broad spectral range, which can be widely applied in multilayer design for the everyday use of these materials in multilayer coatings. Oxide films were deposited by reactive electron-beam evaporation onto various sorts of substrates at 573 K. Transmittance, reflectance, and ellipsometry measurements were performed for each oxide in spectral intervals jointly covering from the extreme ultraviolet to the near infrared; starting with these measurements along with extrapolations, an iterative and double Kramers-Kronig analysis procedure has been followed to obtain a self-consistent set of optical constants per material. With the final data sets, we have satisfactorily reproduced the experimental measurements. Global data self-consistency was successfully evaluated through sum rules, and local consistency at each photon energy range was also evaluated through a novel sum-rule method which involves window functions.

The optical constants of ion-beam-sputtered SiC films have been measured by ellipsometry in the 190 to $950\mathrm{nm}$ range. The set of data has been extended both toward shorter and longer wavelengths with data in the literature, along with inter- and extrapolations, in order to obtain a self-consistent set of data by means of Kramers–Krönig analysis. All data correspond to films that were deposited by sputtering on nonheated substrates, and hence they are expected to be amorphous. A bandgap of $1.9\mathrm{eV}$ for the films was fitted from the obtained optical constants. A good global accuracy of the data was estimated through the use of various sum rules. The consistent dataset includes the visible to the extreme ultraviolet (EUV); this large spectrum of characterization will enable the design of multilayer coatings that combine a high reflectance in parts of the EUV with desired performance at a secondary range, such as the visible. To our knowledge, this paper provides the first compilation of the optical constants of amorphous SiC films.

Various fluorides are materials in nature that extend their transparency range to the shortest wavelengths in the far ultraviolet (FUV, 100nm<λ<200 nm). These are relevant materials to prepare multilayer coatings in the FUV for demanding applications such as space instrumentation for astrophysics, solar physics and atmosphere physics, as well as free electron lasers, plasma diagnostics, synchrotron radiation, lithography, spectroscopy, etc. Multilayer design requires an optical constant of the coating materials. Multilayers optimally alternate two transparent materials with contrasting refractive indices. The optical constants of a low-index material, MgF₂, and of two high-index materials, LaF₃ and CeF₃, have been determined in a wide spectral range and are presented here. Thin films of MgF₂, LaF₃, and CeF₃ were deposited by boat evaporation onto substrates at 523 K. Transmittance, reflectance, and ellipsometry measurements were performed in ranges jointly covering the 30-950-nm spectral range. This range was extended with literature data and extrapolations to obtain self-consistent optical constants using the Kramers-Kronig (KK) analysis. An iterative, double KK analysis procedure (successive reflectance-phase and k-n KK analyses) was carried out to obtain a self-consistent set of optical constants per material. With the final data sets, the experimental measurements were satisfactorily reproduced. Global self-consistency of the data sets was successfully evaluated through sum rules; additionally, local self-consistency at each photon energy range was also evaluated through a novel sum-rule method which involves window functions. The new sets of optical constant extend the data availability mainly to the FUV and beyond, particularly for CeF₃, where few data had been reported.

The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the 30-188-nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~70-140-eV range was significantly larger than the reflectance of a C film grown with average ion energy of ~20 eV and of C films deposited by sputtering or evaporation. The difference is attributed to a large proportion of sp³ atom bonding in the ta-C film. This high reflectance is obtained for films deposited onto room-temperature substrates. The reflectance of ta-C films is higher than the standard single-layer coating materials in the EUV spectral range below 130 nm. A self-consistent set of optical constants of ta-C films was obtained with the Kramers-Krönig analysis using ellipsometry measurements in the 190-950 nm range and the EUV reflectance measurements. These optical constants allowed calculating the EUV reflectance of ta-C films at grazing incidence for applications such as free electron laser mirrors.

Tauc-Lorentz model is commonly used to describe the dielectric constant of amorphous semiconductors as a function of few parameters. However, this model is not fully analytic and presents other mathematical shortcomings. A modified self-consistent model based on the integration of [E’-(E + ia)]-1 functions using Tauc-Lorentz`s ε₂ expression as a weight function is presented. This new model is analytic and meets all other mathematical requirements of optical constants. The main difference with TL model stands at photon energies close to or smaller than the bandgap energy. The new model has been satisfactorily tested on SiC optical constants. Additionally, an analytic extension of the new model has been also developed to include the Urbach tail. The complete model has been tested with Si₃N₄ optical constants, and it enables to extend the optical-constant characterization of materials down to zero energy.

The optical constants of ion-beam-sputtered ${\mathrm{B}}_4\mathrm{C}$ films have been measured by ellipsometry in the $190–950\mathrm{nm}$ range. The set of data has been extended toward both shorter and longer wavelengths with data in the literature, along with interpolations and extrapolations, in order to obtain a self-consistent set of data by means of Kramers–Krönig analysis. All data correspond to films that were deposited by sputtering on nonheated substrates, and hence they are expected to be amorphous. The ${\mathrm{B}}_4\mathrm{C}$ bandgap was calculated as a fitting parameter of Tauc equations for indirect transitions using the present optical constants. Good global accuracy of the data was estimated through the use of various sum rules. The consistent data set includes the visible to the extreme UV (EUV); this large spectrum of characterization will enable the design of multilayer coatings that combine a relatively high reflectance in parts of the EUV with a desired performance at a secondary range, such as the visible.