Frank Weber

Mr. Frank Weber

orcid

Research Focus & Metrics

Academic Career Length

27Years (2000-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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1 January 2000 in Journal of Analytical Methods in Chemistry
Verified
Journal Article
Open access
PDF file
KLKeith Levine
Keith Levine
MLMichael A. Levine
Michael A. Levine
FWFrank Weber
Frank Weber
YHYe Hu
Ye Hu
JPJason Perlmutter
Jason Perlmutter
PGPeter M. Grohse
Peter M. Grohse
The concentrations of mercury in forty, commercially available dietary supplements, were determined using a new, inexpensive analysis technique. The method involves thermal decomposition, amalgamation, and detection of mercury by atomic absorption spectrometry with an analysis time of approximately six minutes per sample. The primary cost savings from this approach is that labor-intensive sample digestion is not required prior to analysis, further automating the analytical procedure. As a result, manufacturers and regulatory agencies concerned with monitoring lot-to-lot product quality may find this approach an attractive alternative to the more classical acid-decomposition, cold vapor atomic absorption methodology. Dietary supplement samples analyzed included astragalus, calcium, chromium picolinate, echinacea, ephedra, fish oil, ginger, ginkgo biloba, ginseng, goldenseal, guggul, senna, St John's wort, and yohimbe products. Quality control samples analyzed with the dietary supplements indicated a high level of method accuracy and precision. Ten replicate preparations of a standard reference material (NIST 1573a, tomato leaves) were analyzed, and the average mercury recovery was 109% (2.0% RSD). The method quantitation limit was 0.3 ng, which corresponded to 1.5 ng/g sample. The highest found mercury concentration (123 ng/g) was measured in a concentrated salmon oil sample. When taken as directed by an adult, this product would result in an approximate mercury ingestion of 7 μg per week.

19 August 2010 in Environmental Toxicology
Verified
Journal Article
Closed access
PDF file
SMShad Mosher
Shad Mosher
WCW. Gregory Cope
W. Gregory Cope
FWFrank Weber
Frank Weber
DSDamian Shea
Damian Shea
TKThomas J. Kwak
Thomas J. Kwak

1 January 2007 in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Verified
Journal Article
Closed access
SXSonglin Xu
Songlin Xu
CQCe Qin
Ce Qin
LDLi Diao
Li Diao
DGDave Gilbert
Dave Gilbert
LHLi Hou
Li Hou
FWFrank Weber
Frank Weber
Plasma damage of low-k dielectrics during photoresist (PR) stripping in a dual-damascene process is a critical issue in the application of copper/low-k technology for ⩽45nm nodes to increase the signal processing speed of integrated circuit devices. In this article, a detailed and systematic work has been conducted to study the low-k damage on porous methyl silsesquioxane ultralow-k films using various PR strip chemistries and process conditions on a high density plasma reactor. The experimental results obtained from different test methodologies show that the low-k damage generated under fixed process conditions increases in the order of NH3<N2<H2∕N2<H2<O2. Among plasma control parameters, bias power has a very pronounced effect on low-k damage for reducing chemistries due to the acceleration of Si–C bond breaking by ion bombardment. Source power also affects the low-k damage significantly as it controls the ion density and flux to the wafer surface. The pressure effect is more complicated and shows different characteristics for oxidizing and reducing chemistries. The extent of low-k damage depends on the orientation of the wafer surface exposed to the plasma, leading to different sensitivity of the damage to the strip chemistry and process condition. Based on this work, an optimized chemistry and process regime are identified to effectively reduce low-k damage and achieve good strip process performance.

STSteven Thygerson
Steven Thygerson
JBJohn D. Beard
John D. Beard
MHMarion J. House
Marion J. House
RSRilee L. Smith
Rilee L. Smith
HBHunter C. Burbidge
Hunter C. Burbidge
James JohnstonJames Johnston
James Johnston
Brick workers and their families in Nepal generally live in poorly ventilated on-site housing at the brick kiln, and may be at higher risk for non-occupational exposure to fine particulate matter air pollution and subsequent respiratory diseases due to indoor and outdoor sources. This study characterized non-occupational exposure to PM2.5 by comparing overall concentrations and specific chemical components of PM2.5 inside and outside of brick workers’ on-site housing. For all samples, the geometric mean PM2.5 concentration was 184.65 μg/m3 (95% confidence interval: 134.70, 253.12 μg/m3). PM2.5 concentrations differed by kiln number (p = 0.009). Kiln number was significantly associated with 16 of 29 (55%) air pollutant, temperature, or relative humidity variables. There was not a significant interaction between kiln number and location of sample for PM2.5 (p = 0.16), but there was for relative humidity (p = 0.02) and temperature (p = 0.01). Results were qualitatively similar when we repeated analyses using indoor samples only. There was no difference in the chemical makeup of indoor and outdoor PM2.5 in this study, suggesting that outdoor PM2.5 air pollution easily infiltrates into on-site brick worker housing. Outdoor and indoor PM2.5 concentrations found in this study far exceed recommended levels. These findings warrant future interventions targeted to this vulnerable population.

1 August 2015 in Talanta
Verified
Journal Article
Closed access
KLKeith Levine
Keith Levine
DYDaniel J. Young
Daniel J. Young
SAScott E. Afton
Scott E. Afton
James HarringtonJames Harrington
James Harrington
AEAmal S. Essader
Amal S. Essader
SWSuramya Waidyanatha
Suramya Waidyanatha

21 December 2016 in Journal of Exposure Science & Environmental Epidemiology
Verified
Journal Article
Closed access
PDF file
CSChantel Sloan
Chantel Sloan
FWFrank Weber
Frank Weber
RBRebecca K Bradshaw
Rebecca K Bradshaw
TPTyler J Philipp
Tyler J Philipp
WBW Bradford Barber
W Bradford Barber
James JohnstonJames Johnston
James Johnston