Ag–TiCN coatings were deposited by dc reactive magnetron sputtering and their structural and morphological properties were evaluated. Compositional analysis showed the existence of Ag–TiCN coatings with different Ag/Ti atomic ratios (ranging from 0 to 1.49). The structural and morphological properties are well correlated with the evolution of Ag/Ti atomic ratio. For the samples with low Ag/Ti atomic ratio (below 0.20) the coatings crystallize in a B1-NaCl crystal structure typical of TiC_0.3N_0.7. The increase in Ag/Ti atomic ratio promoted the formation of Ag crystalline phases as well as amorphous CN _x phases detected in both x-ray photoelectron spectroscopy and Raman spectroscopy analysis. Simultaneously to the formation of Ag crystalline phases and amorphous carbon-based phases, a decrease in TiC_0.3N_0.7 grain size was observed as well as the densification of coatings.

High-Power Impulse Magnetron Sputtering (HiPIMS) has emerged as an excellent technology for producing high-quality nitride coatings, such as aluminum nitride (AlN), titanium nitride (TiN), chromium nitride (CrN), and silicon nitride (SiN), and composite nitride coatings such as titanium aluminum nitride (TiAlN), TiAlNiCN, etc. These coatings are known for their exceptional hardness, thermal stability, and corrosion resistance. These make them ideal for high-performance applications. HiPIMS distinguishes itself by generating highly ionized plasmas that facilitate intense ion bombardment, leading to nitride films with superior mechanical strength, durability, and enhanced thermal properties compared to traditional deposition techniques. Critical HiPIMS parameters, including pulse duration, substrate bias, and ion energy, are analyzed for their influence on enhancing coating density, adhesion, and hardness. The review contrasts HiPIMS with other deposition methods, highlighting its unique ability to create dense, uniform coatings with improved microstructures. While HiPIMS offers substantial benefits, it also poses challenges in scalability and process control. This review addresses these challenges and discusses hybrid, bipolar, and synchronized HiPIMS solutions designed to optimize nitride coating processes. Hybrid HiPIMS, for instance, combines HiPIMS with other sputtering techniques like DCMS or RF sputtering to achieve balanced deposition rates and high-quality film properties. Bipolar HiPIMS enhances process stability and film uniformity by alternating the polarity, which helps mitigate charge accumulation issues. Synchronized HiPIMS controls precise pulse timing to maximize ion energy impact and improve substrate interaction, further enhancing the structural properties of the coatings. Hence, to pave the way for future research and development in this area, insights of the HiPIMS have been presented that underline the role of HiPIMS in meeting the demanding requirements of advanced industrial applications. Overall, this review article comprehensively analyzes the recent strategies and technological innovations in HiPIMS and highlights the significant potential of HiPIMS for advancing the nitride coating field.

Metal-coated plastic parts are replacing traditional metallic materials in the automotive industry. Sputtering is an alternative technology that is more environmentally friendly than electrolytic coatings. Most metalized plastic parts are coated with a thin metal layer (~100–200 nm). In this work, the challenge is to achieve thicker films without cracking or without other defects, such as pinholes or pores. Chromium coatings with different thicknesses were deposited onto two different substrates, polycarbonate with and without a base coat, using dc magnetron sputtering in an atmosphere of Ar. Firstly, in order to improve the coating adhesion on the polymer surface, a plasma etching treatment was applied. The coatings were characterized for a wide thickness range from 800 nm to 1600 nm. As the thickness of the coatings increased, there was an increase in the specular reflectivity and roughness of the coatings and changes in morphology due to the columnar growth of the film and a progressive increase in thermal stresses. Furthermore, a decrease in the hardness and the number of pinholes was noticed. The maximum thickness achieved without forming buckling defects was 1400 nm. The tape tests confirmed that every deposited coating showed a good interface adhesion to both polymers.