In deterministic computer-controlled optical surfacing, accurate dwell time execution by computer numeric control machines is crucial in guaranteeing a high-convergence ratio for the optical surface error. It is necessary to consider the machine dynamics limitations in the numerical dwell time algorithms. In this paper, these constraints on dwell time distribution are analyzed, and a model of the equal extra material removal is established. A positive dwell time algorithm with minimum equal extra material removal is developed. Results of simulations based on deterministic magnetorheological finishing demonstrate the necessity of considering machine dynamics performance and illustrate the validity of the proposed algorithm. Indeed, the algorithm effectively facilitates the determinacy of sub-aperture optical surfacing processes.

A macro–micro dual-drive positioning system was developed for Scanning Beam Interference Lithography (SBIL) which uses a dual-frequency laser interferometer as the position reference and exhibits the characteristics of long travel, heavy load, and high accuracy. The macro-motion system adopts a friction-driven structure and a feedforward PID control algorithm, and the stroke can reach 1800 mm. The micro-motion system adopts a flexible hinge–plus-PZT driving method and a PID control algorithm based on neural networks, which achieves sufficient positioning accuracy of this system at the nanometer level. An optical-path-sealing system was used to reduce the measurement noise of the dual-frequency laser interferometer. The static stability of the positioning system, the stepping capacity of the macro-motion system, the stepping capacity of the micro-motion system, and the positioning accuracy of the system were tested and analyzed. Additionally, the sources and effects of errors during the motion process were assessed in detail. Finally, the experimental results show that the workbench can locate at the nanoscale within the full range of travel, which can satisfy the SBIL exposure requirement.

Magnetorheological jet polishing (MJP) plays an important role in polishing complex cavities and special optical elements with high precision. However, the roughness distribution function that describes the variation with polishing time of the roughness value of every area in the polishing area has not been studied deeply. In this paper, the influence of the roughness distribution on the removal function of MJP in optics (with a roughness of less than 10 nm) and its evolution model in the spatial and time domains are studied. With the increase of polishing time, the surface roughness of the central area linearly increases, forming surface defects, such as pits. The roughness of the polishing area exhibits a limited growth trend. Verification experiments are carried out on BK7 glass. The results of the roughness distribution on the removal function prove the correctness of the model. The model laid a foundation; therefore, it has important guidance and reference value for the application to the whole aperture polishing.

Testing accuracy is an essential factor in determining the manufacturing accuracy of aspheric mirrors. Because of the complexity of the null compensation test, the coherent stray lights generated by multiple reflections and transmissions between optical elements and the crosstalk fringes generated by the multi-beam interference of the reference light, test light, and stray lights are superimposed on the interference fringes, resulting in reduced testing accuracy. Focusing on this problem, a simulation analysis method for crosstalk fringes based on ray-tracing and multi-beam interference in interference testing is proposed. The coordinates, amplitudes, and phases of the test light and stray lights on the transmission sphere are traced, and the crosstalk fringes and interference testing fringes and their positions, sizes, and intensity information are simulated via multi-beam interference. The influence of crosstalk fringes on interference fringes is determined. An experimental optical path is built to verify the correctness of the crosstalk fringe simulation method.

Silicon carbide (Sic) materials find wide-ranging applications in advanced optical systems within the aerospace, astronomical observation, and high-intensity laser fields. The silicon-modified Sic used in this study was created by depositing an amorphous silicon film on the surface of a Sic substrate using electron beam evaporation. Such hard and brittle materials often yield smooth surfaces when subjected to plastic removal. To address the issue of the removal depth of the surface plastic domain for silicon-modified Sic, we propose a method to calculate the indentation depth based on the critical load for the transition from plastic to brittle removal. We conducted a series of nanoindentation and nanoscratching experiments. The critical depth formula was validated through mechanical parameters such as hardness, elastic modulus, and fracture toughness, and the theoretical critical depth of the modified silicon layer was calculated to be 2.71 μm. The research results indicate that the critical load for obtaining the plastic-to-brittle transition point during the nanoindentation experiment is 886 mN, at which point the depth of plastic removal is 2.95 μm, closely matching the theoretical value. The measurements taken with an atomic force microscope near the critical load reveal a scratch depth of 3.12 μm, with a relative error of less than 5% when compared to the calculated value. This study establishes a solid foundation for achieving high-quality surface processing.