In this letter, we report for the first time very large phase shifts of microwaves in the 1–10 GHz range, in a 1 mm long gold coplanar interdigitated structure deposited over a 6 nm Hf _x Zr _{1− x} O ₂ ferroelectric grown directly on a high resistivity silicon substrate. The phase shift is larger than 60° at 1 GHz and 13° at 10 GHz at maximum applied DC voltages of ±3 V, which can be supplied by a simple commercial battery. In this way, we demonstrate experimentally that the new ferroelectrics based on HfO ₂ could play an important role in the future development of wireless communication systems for very low power applications.

In this paper, we present microwave filters that are based on 6-nm-thick ferroelectric thin films of hafnium oxide doped with zirconium (HfZrO), which are tunable continuously in targeted bands of interest within the frequency range 0.1–16 GHz, when the applied direct current (DC) voltage is swept between 0 V and 4 V. Here, we exploit the orthorhombic polar phase in HfO₂ through a careful doping using zirconium in an Atomic Layer Deposition (ALD) process, in order to guarantee phase stabilization at room temperature. Polarization versus voltage characterization has been carried out, showing a remanent polarization (P_r) of ~0.8 μC/cm² and the coercive voltage at ~2.6 V. The average roughness has been found to be 0.2 nm for HfZrO films with a thickness of 6 nm. The uniform topography, without holes, and the low surface roughness demonstrate that the composition and the structure of the film are relatively constant in volume. Three filter configurations (low-pass, high-pass, and band-pass) have been designed, modelled, fabricated, and fully characterized in microwaves, showing a frequency shift of the minimum of the reflection coefficient between 90 MHz and 4.4 GHz, with a minimum insertion loss of approximately 6.9 dB in high-pass configuration.

In this paper, the first demonstration of a bow-tie antenna integrated with a metal-insulator-metal (MIM) diode for electromagnetic energy harvesting in the V-band (i.e., 40-75 GHz) is presented. We have designed, simulated, fabricated, and fully characterized a 60-GHz rectifying antenna (rectenna) based on a vertical Au-HfO₂-Pt MIM diode with reduced differential resistance. The dielectric used for the MIM structure is a 6-nm-thick amorphous HfO₂ grown by atomic layer deposition. For the fabricated MIM device, we report here a current density of 3 x 10⁴ A/cm² that exceeds the previous values presented in the literature. The vertical MIM-based rectenna is able to efficiently harvest up to 250 μV from an impinging modulated millimeter-wave signal with -20 dBm of available power, thus offering a voltage responsivity of over 5 V/W. The reported results indicate that the proposed approach is well suited for future low-power solutions much sought after for the energetically autonomous 5G terminal equipment.

A compact analytical model is proposed along with a parameter extraction methodology to accurately capture the steady-state (DC) sequential tunneling current observed in the subthreshold region of the transfer $I_{DS}-V_{GS}$ characteristics of MOSFETs at cryogenic temperatures. The model is shown to match measurements of $p$ -MOSFETs and $n$ -MOSFETs manufactured in a commercial 22nm FDSOI foundry technology, with reasonable accuracy across bias conditions and temperature (2 K - 50 K). Furthermore, the extracted model parameters are used to analyze the impact of the gate and drain voltages and of layout geometry on the device characteristics.