The effect of Be layers on the reflection coefficients of Mo/Be/Si multilayer mirrors in the extreme ultraviolet (EUV) region is reported. Samples were studied using laboratory and synchrotron based reflectometry, and high-resolution transmission electron microscopy. The samples under study have reflection coefficients above 71% at 13.5 nm and more than 72% at 12.9 nm in a near normal incidence mode. Calculations show that by optimizing the thickness of the Be layer it should be possible to increase the reflection coefficient by another 0.5–1%. These results are of considerable interest for EUV lithography.

We show that a magnetic strip on top of a superconducting strip magnetized in a specified direction may considerably enhance the critical current in the sample. At fixed magnetization of the magnet we observed the diode effect—the value of the critical current depends on the direction of the transport current. We explain these effects by a influence of the nonuniform magnetic field induced by the magnet on the current distribution in the superconducting strip. The experiment on a hybrid $\mathrm{Nb}∕\mathrm{Co}$ structure confirmed the predicted variation of the critical current with a changing value of magnetization and direction of the transport current.

Co/Pt multilayers with perpendicular magnetic anisotropy are irradiated by focused He⁺ ion beam to locally reduce the anisotropy value. The irradiated spots with a diameter of 100 nm are arranged in a square lattice with 200 nm period. The formation of the nonuniform periodic magnetic structure is observed without changes in the film topography. The spatial symmetry of the magnetic force microscopy signal and the specific shape of magnetization curves indicate the formation of the magnetic bubbles or magnetic vortices within the irradiated spot depending on the irradiation dose. The experimental data are in a good agreement with micromagnetic simulations of the system.

We report on results of computer micromodelling of antivortex states in asymmetrical crosslike ferromagnetic nanoparticles and their practical realization. The arrays of cobalt crosses with 1$\hskip0.3em${}$\mu${}m branches, 100 nm widths of the branches and 40 nm thicknesses, were fabricated using e-beam lithography and ion etching. Each branch of the cross was tapered at one end and bulbous at the other. The stable formation of antivortex magnetic states in these nanostructures during magnetization reversal was demonstrated experimentally using magnetic force microscopy.

A comparative study was carried out of the structure and reflection performance of four types of multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be structure and three Mo/Be-based structures with thin B₄C, C and Si interlayers. It was demonstrated that Mo/Be mirrors show maximum reflectance at normal incidence, while maximum structural perfection is shown by Mo/Be/Si mirrors. The introduction of B₄C and C layers into the structure increases the interlayer roughness and reduces the sharpness of the interfaces, adversely affecting the target coating characteristics. Results are presented for studies using four techniques: X-ray reflectometry, small-angle X-ray scattering, atomic force microscopy, and transmission electron microscopy.