Carsten Woidt was born in 1983. He received his diploma degree in Nanostructure and Molecular Sciences from Kassel University in 2010. From 2010 to 2017, he worked at the Institute of Nanostructure Technologies and Analytics, Kassel, Germany. From 2010 to 2014, he led the Nanospectrometer group for miniaturized UV-VIS-IR spectroscopy in the field of Microsystem Technology. His main fields of study are plasma assisted deposition and etching systems as well as Nanoimprint lithography. Since 2017, he has been working in the field of daylight guiding micro mirros systems at Photonik Inkubator GmbH, Göttingen, Germany.
Carsten Woidt was born in 1983. He received his diploma degree in Nanostructure and Molecular Sciences from Kassel University in 2010. From 2010 to 2017, he worked at the Institute of Nanostructure Technologies and Analytics, Kassel, Germany. From 2010 to 2014, he led the Nanospectrometer group for miniaturized UV-VIS-IR spectroscopy in the field of Microsystem Technology. His main fields of study are plasma assisted deposition and etching systems as well as Nanoimprint lithography. Since 2017, he has been working in the field of daylight guiding micro mirros systems at Photonik Inkubator GmbH, Göttingen, Germany.