Magnetron sputtering is one of the most commonly used deposition techniques, which has received considerable attention in industrial applications. In particular, owing to its compatibility with conventional fabrication processes, it can produce and fabricate high-quality dense thin films of a wide range of materials. In the present study, nitrogen (N) was combined with pure vanadium in order to form binary nitride to improve its mechanical and tribological performance. To evaluate the influence of nitrogen on the structure of the as-deposited vanadium nitride (VN) coatings, the following techniques were used: XPS, XRD, SEM, AFM and optical profilometry. The residual stresses were determined by the curvature method using Stoney’s formula. The hardness and Young’s modulus were obtained by nanoindentation measurements. The friction behavior and wear characteristics of the films were evaluated by using a ball-on-disk tribometer. The obtained results showed that the N/V ratio increased with increasing the N₂ flow rate while the deposition rate decreased. The preferred orientation was changed from (200) to (111) as the N₂ flow rate increased with the presence of V–N and V–O binding energies as confirmed by XPS analysis. The nitrogen addition resulted in a columnar morphology and a fine structure with fine surface roughness. The VN thin film containing 49.5 at.% of nitrogen showed the best performance: highest mechanical properties (hardness = 25 GPa), lowest friction coefficient (μ = 0.37) and lowest wear rate (W_s = 2.72 × 10⁻⁵ mm³N⁻¹ m⁻¹). A good correlation between the film microstructure, crystallite size, residual stress and mechanical and tribological properties was observed.

The current economic and ecological situation encourages the use of steel to push the technological limits and offer more cost-effective products. The enhancement of steel properties like wear, corrosion, and oxidation resistance is achieved by the addition of small amounts of chemical elements such as Cr, Ni, Si, N, etc. The steel surface can be protected by different treatments such as heating and coating, among others. For many decades, coatings have been an effective solution to protect materials using thin hard films. Several technologies for thin film deposition have been developed. However, some of them are restricted to certain fields because of their complex operating conditions. In addition, some deposition techniques cannot be applied to a large substrate surface type. The magnetron sputtering deposition process is a good option to overcome these challenges and can be used with different substrates of varying sizes with specific growth modes and for a wide range of applications. In this review article, we present the sputtering mechanism and film growth modes and focus on the mechanical and tribological behavior of nitride thin films deposited by the magnetron sputtering technique as a function of process conditions, particularly bias voltage and nitrogen percentage. The biomedical properties of transition metal nitride coatings are also presented.

Ever since the discovery of black silicon, scientists have been trying to come up with novel methods of utilizing this material in a variety of different industries due to its low reflectivity and excellent electronic and optoelectronic properties.