Molybdenum trioxide (MoO3) in-plane anisotropy has increasingly attracted the attention of the scientific community in the last few years. Many of the observed in-plane anisotropic properties stem from the anisotropic refractive index and elastic constants of the material but a comprehensive analysis of these fundamental properties is still lacking. Here we employ Raman and micro-reflectance measurements, using polarized light, to determine the angular dependence of the refractive index of thin MoO3 flakes and we study the directional dependence of the MoO3 Young’s modulus using the buckling metrology method. We found that MoO3 displays one of the largest in-plane anisotropic mechanical properties reported for 2D materials so far.
Finding 2D and thin‐film layered materials have become essential to develop not only in scientific‐related fields, but also in a wide industry, which is constantly feeding from this progress. For electronic devices, thin‐film materials are supposed to be a step forward to overcome Moore's law. In many other technologic areas, the development of tools based on flakes of materials has found new physics, becoming a rising field. Although, destructive techniques are commonly used to characterize the thickness of these materials. Herein, a list of materials is presented, whose thicknesses are characterized by their apparent colors in several substrates, a harmless, fast, and reliable technique that has been already used to determine the number of layers in several works. This list is also enlarged with other materials and substrates.
Considering that two-dimensional (2D) molybdenum trioxide has acquired more attention in the last few years, it is relevant to speed up thickness identification of this material. We provide two fast and non-destructive methods to evaluate the thickness of MoO3 flakes on SiO2/Si substrates. First, by means of quantitative analysis of the apparent color of the flakes in optical microscopy images, one can make a first approximation of the thickness with an uncertainty of ±3 nm. The second method is based on the fit of optical contrast spectra, acquired with micro-reflectance measurements, to a Fresnel law-based model that provides an accurate measurement of the flake thickness with ±2 nm of uncertainty.
24 January 2024 in npj 2D Materials and Applications
This work investigates the vibrational and electrical properties of molybdenum trioxide (α-MoO3) upon tensile strain applied along different crystal directions. Using a three-point bending setup in combination with Raman spectroscopy, we report measurements of a blueshift of the Raman modes when uniaxial tensile strain is applied along the a- and c-axis to this material. Furthermore, the electrical measurements reveal an increase in resistance with strain applied along both in-plane directions. The findings from the uniaxial strain and Raman spectroscopy measurements are further confirmed by ab-initio calculations. This study provides valuable insights into the mechanical and vibrational properties of α-MoO3 and its potential use in several applications. This study contributes to the growing body of knowledge on the properties of α-MoO3 and lays the foundation for further exploration of its potential applications. Given MoO3 holding the natural hyperbolic phonon polaritons, attracting significant research interest, this study has the potential to arouse the curiosity of the scientific community.
21 August 2023 in npj 2D Materials and Applications
We report on outstanding photo-responsivity, R > 103 A/W, fast response (~0.1 s), and broadband sensitivity ranging from the UV to the NIR in two terminal graphene/MoS2 photodetectors. Our devices are based on the deterministic transfer of MoS2 on top of directly grown graphene on sapphire, and their performance outperforms previous similar photodetectors using large-scale grown graphene. Here we devise a protocol for the direct growth of transparent (transmittance, Tr > 90%), highly conductive (sheet resistance, R□ < 1 kΩ) uniform and continuous graphene films on sapphire at 700 °C by using plasma-assisted chemical vapor deposition (CVD) with C2H2/H2 gas mixtures. Our study demonstrates the successful use of plasma-assisted low-temperature CVD techniques to directly grow graphene on insulators for optoelectronic applications.
We perform X-ray diffraction and AFM characterization of CdSe-nano-pyramids layers up to monolayer covering. The CdSe-particles are perfectly ordered growing with an axial and lateral matching with the HOPG substrate lattice in a hexagonal arrange.