The development of graphene-based materials for optical limiting functionality is an active field of research. Optical limiting for femtosecond laser pulses in the infrared-B (IR-B) (1.4–3 μm) spectral domain has been investigated to a lesser extent than that for nanosecond, picosecond and femtosecond laser pulses at wavelengths up to 1.1 μm. Novel nonlinear optical materials, glassy graphene oxide (GO)-based silico-phosphate composites, were prepared, for the first time to our knowledge, by a convenient and low cost sol-gel method, as described in the paper, using tetraethyl orthosilicate (TEOS), H₃PO₄ and GO/reduced GO (rGO) as precursors. The characterisation of the GO/rGO silico-phosphate composite films was performed by spectroscopy (Fourier-transform infrared (FTIR), Ultraviolet–Visible-Near Infrared (UV-VIS-NIR) and Raman) and microscopy (atomic force microscopy (AFM) and scanning electron microscopy (SEM)) techniques. H₃PO₄ was found to reduce the rGO dispersed in the precursor’s solution with the formation of vertically agglomerated rGO sheets, uniformly distributed on the substrate surface. The capability of these novel graphene oxide-based materials for the optical limiting of femtosecond laser pulses at 1550 nm wavelength was demonstrated by intensity-scan experiments. The GO or rGO presence in the film, their concentrations, the composite films glassy matrix, and the film substrate influence the optical limiting performance of these novel materials and are discussed accordingly.

The ultrafast third-order optical nonlinearity of c-plane GaN crystal, excited by ultrashort (fs) high-repetition-rate laser pulses at 1550 nm, wavelength important for optical communications, is investigated for the first time by optical third-harmonic generation in non-phase-matching conditions. As the thermo-optic effect that can arise in the sample by cumulative thermal effects induced by high-repetition-rate laser pulses cannot be responsible for the third-harmonic generation, the ultrafast nonlinear optical effect of solely electronic origin is the only one involved in this process. The third-order nonlinear optical susceptibility of GaN crystal responsible for the third-harmonic generation process, an important indicative parameter for the potential use of this material in ultrafast photonic functionalities, is determined.

Due to the increased application of lasers in different fields (industry, medicine, etc.), there is a growing need for new laser sources with good beam quality and variable emission wavelength. At the same time, for environmental reasons, the obtaining of novel eco-friendly active optical materials, such as those based on the deoxyribonucleic acid (DNA) biopolymer, with optimal light emission properties, is of high interest. The results obtained in this study of the temporal dependence of the transmittance and of the light emission in thin films of DNA–CTMA–Rhodamine 610 (at different Rhodamine concentrations) (DNA–CTMA–Rh610), when they are illuminated with continuous wave laser light at 532 nm (frequently used in the optical pumping of dye lasers), are presented and discussed. The transmittance results obtained for thin film samples are compared to those obtained for the DNA–CTMA–Rh610 solutions in butanol, from which the films have been made, and also with those obtained for Rh610 solutions in butanol with the same concentrations. The investigation was performed in order to assess the influence of the DNA-CTMA and of the green laser light at 532 nm wavelength on relevant chromophore properties such as light transmission and fluorescence emission. The results obtained revealed that the DNA–CTMA matrix has an active influence on the Rhodamine 610 emission, in the whole range of concentrations of the investigated samples.