Low-loss photonic integrated circuits (PICs) are the key elements in future quantum technologies, nonlinear photonics and neural networks. The low-loss photonic circuits technology targeting C-band application is well established across multi-project wafer (MPW) fabs, whereas near-infrared (NIR) PICs suitable for the state-of-the-art single-photon sources are still underdeveloped. Here, we report the labs-scale process optimization and optical characterization of low-loss tunable photonic integrated circuits for single-photon applications. We demonstrate the lowest propagation losses to the date (as low as 0.55 dB/cm at 925 nm wavelength) in single-mode silicon nitride submicron waveguides (220×550 nm). This performance is achieved due to advanced e-beam lithography and inductively coupled plasma reactive ion etching steps which yields waveguides vertical sidewalls with down to 0.85 nm sidewall roughness. These results provide a chip-scale low-loss PIC platform that could be even further improved with high quality SiO₂ cladding, chemical-mechanical polishing and multistep annealing for extra-strict single-photon applications.

The Indium Tin Oxide (ITO) platform is one of the promising solutions for state-of-the-art integrated optical modulators towards low-loss silicon photonics applications. One of the key challenges on this way is to optimize ITO-based thin films stacks for electro-optic modulators with both high extinction ratio and low insertion loss. In this paper we demonstrate the e-beam evaporation technology of 20 nm-thick ITO films with low extinction coefficient of 0.14 (N_c = 3.7·10²⁰ cm⁻³) at 1550 nm wavelength and wide range of carrier concentrations (from 1 to 10 × 10²⁰ cm⁻³). We investigate ITO films with amorphous, heterogeneously crystalline, homogeneously crystalline with hidden coarse grains and pronounced coarsely crystalline structure to achieve the desired optical and electrical parameters. Here we report the mechanism of oxygen migration in ITO film crystallization based on observed morphological features under low-energy growth conditions. Finally, we experimentally compare the current–voltage and optical characteristics of three electro-optic active elements based on ITO film stacks and reach strong ITO dielectric permittivity variation induced by charge accumulation/depletion (Δn = 0.199, Δk = 0.240 at λ = 1550 nm under ± 16 V). Our simulations and experimental results demonstrate the unique potential to create integrated GHz-range electro-optical modulators with sub-dB losses.

Silver and gold are the most commonly used materials in optics and plasmonics. Silver has the lowest optical losses in the visible and near-infrared wavelength range, but it faces a serious problem—degradation over time. It has been repeatedly reported that the optical properties of silver thin films rapidly degrade when exposed to the atmosphere. This phenomenon was described by various mechanisms: rapid silver oxidation, sorption of sulfur or oxygen, formation of silver compounds with chlorine, sulfur, and oxygen. In this work, we systematically studied single-crystalline silver films from 25 to 70 nm thicknesses for almost two years. The surface morphology, crystalline structure and optical characteristics of the silver films were measured using spectroscopic ellipsometry, ultra-high-resolution scanning electron microscopy, and stylus profilometry under standard laboratory conditions. After 19 months, bulk structures appeared on the surface of thin films. These structures are associated with relaxation of internal stresses combined with dewetting. Single-crystalline silver films deposited using the single-crystalline continuous ultra-smooth, low-loss, low-cost (SCULL) technology with a thickness of 35–50 nm demonstrated the best stability in terms of degradation. We have shown that the number of defects (grain boundaries and joints of terraces) is one of the key factors that influence the degradation intensity of silver films.

We demonstrate a perspective approach for the fabrication of functional high-quality magnetoplasmonic crystals based on a 2D periodical perforated silver film covered by a thin layer of ferromagnetic metal (Permalloy). The wavelength-angular spectra of the 2D crystals reveal a large number of high-quality resonant features associated with the excitation of surface plasmon-polariton modes of various orders. Due to the presence of a ferromagnetic material on both plasmonic interfaces, pronounced magnetic effects are observed for all excitations and are influenced by the coupling between various modes. The suggested magnetoplasmonic crystal composition with high-quality resonant optical and magneto-optical properties gives perspective for the control over the light propagation as well as for sensor applications.

Photonic integrated circuits play a crucial role in almost every aspect of modern life, such as data storage, telecommunications, medical diagnostics, green energy, autonomous driving, agriculture, and high-performance computing. To fully harness their benefits, an efficient coupling mechanism is required to successfully launch light into on-chip waveguides from fibers. This study introduces low-loss coupling strategies and their implementation for silicon nitride integrated photonics. Here we present an overview of coupling technologies, optimized designs, and a fabrication technique for inverse tapers, which enable effective coupling for both transverse-magnetic and transverse-electric modes. We measured the coupling losses of 0.15 dB for UHNA-7 fiber at 1550 nm per facet for single-mode 220 × 1200 nm waveguides. We also designed, fabricated, and experimentally characterized a multi-tip taper, yielding 1.5 dB per facet at 1550 nm with broadband stability over 1500–1600 nm. We believe that our approach is universal and can be used both for individual fiber and fiber arrays coupling and for subsequent assembly of fiber with a chip, ensuring minimal losses.