A novel material platform based on metallic thin films with ultra-low losses in the visible and near-IR range is crucial for rapid development of a wide range of new generation plasmonic devices. For many years silver has been known as potentially the best plasmonic material with the naturally lowest ohmic losses at optical frequencies. However, the widespread implementation of the silver-based material platform for plasmonics and metamaterials is limited due to technological challenges in thin film synthesis and nanoscale features fabrication techniques. This review describes the main types of silver-based plasmonic devices from the thin films point of view required for their widespread practical application. Based on comparative analysis of more than 60-year-long history of previously reported data for the silver thin films, the authors formulate the qualitative and quantitative criteria of "ideal" silver film (which the authors name the silver "dream" plasmonic film) for plasmonic devices with ultra-low loss. This paper outlines on several well-known metrology issues in plasmonic metallic films characterization and summarize the set of methods for their properties careful and precise extraction. Finally, the detailed analysis of silver synthesis techniques and quantitative comparison of the achieved silver properties is carried out.

In recent years, we have been witnessing the intensive development of optical gas sensors. Thin palladium and platinum films as well as tungsten trioxide films with palladium or platinum catalysts are widely used for hydrogen detection, and the optical constants of these materials are required for sensor development. We report the optical parameters retrieved from a set of ellipsometric and transmission spectra for electron-beam evaporated palladium, platinum, and tungsten trioxide films. The tungsten trioxide films were 81 nm, 162 nm, and 515 nm thick and the metal films were as thin as 5–7 nm. Ultrathin palladium and platinum films were shown to be successfully described by local and isotropic permittivity, which is quite different from known bulk values. However, this permittivity showed a strong dependence on adjacent materials, thus illustrating that the ultrathin metallic films can be considered composites characterized by effective permittivity. With the obtained refractive indices and permittivities, the optical spectra of fabricated WO₃/Pd and WO₃/Pt nanostructures incorporating 1D grating of Al₂O₃ were in an excellent agreement with the calculated ones without requiring any additional fitting procedures or inclusion of surface roughness layers in numerical models.

Low-loss photonic integrated circuits (PICs) are the key elements in future quantum technologies, nonlinear photonics and neural networks. The low-loss photonic circuits technology targeting C-band application is well established across multi-project wafer (MPW) fabs, whereas near-infrared (NIR) PICs suitable for the state-of-the-art single-photon sources are still underdeveloped. Here, we report the labs-scale process optimization and optical characterization of low-loss tunable photonic integrated circuits for single-photon applications. We demonstrate the lowest propagation losses to the date (as low as 0.55 dB/cm at 925 nm wavelength) in single-mode silicon nitride submicron waveguides (220×550 nm). This performance is achieved due to advanced e-beam lithography and inductively coupled plasma reactive ion etching steps which yields waveguides vertical sidewalls with down to 0.85 nm sidewall roughness. These results provide a chip-scale low-loss PIC platform that could be even further improved with high quality SiO₂ cladding, chemical-mechanical polishing and multistep annealing for extra-strict single-photon applications.

We demonstrate the optical medium for surface plasmon-polariton wave (SPP) propagation with ultra low losses corresponding to the theoretically limited values. The unique element of the optical medium is an atomically-flat single-crystalline silver thin film that provides extremely low losses. The SPP excited on the surface of such thin films (λ = 780 nm) is characterized by a SPP propagation length equal to 200 µm, which is twice longer than previously reported experimental results and corresponds to theoretically limited values for silver films.

Surface-enhanced Raman spectroscopy (SERS) has been intensely studied as a possible solution in the fields of analytical chemistry and biosensorics for decades. Substantial research has been devoted to engineering signal enhanced SERS-active substrates based on semi-continuous nanostructured silver and gold films, or agglomerates of micro- and nanoparticles in solution. Herein, we demonstrate the high-amplitude spectra of myoglobin precipitated out of ultra-low concentration solutions (below 10 μg/mL) using e-beam evaporated continuous self-assembled silver films. We observe up to 10⁵ times Raman signal amplification with purposefully designed SERS-active substrates in comparison with the control samples. SERS-active substrates are obtained by electron beam evaporation of silver thin films with well controlled nanostructured surface morphology. The characteristic dimensions of the morphology elements vary in the range from several to tens of nanometers. Using optical confocal microscopy we demonstrate that proteins form a conformation on the surface of the self-assembled silver film, which results in an effective enhancement of giant Raman scattering signal. We investigate the various SERS substrates surface morphologies by means of atomic force microscopy (AFM) in combination with deep data analysis with Gwyddion software and a number of machine learning techniques. Based on these results, we identify the most significant film surface morphology patterns and evaporation recipe parameters to obtain the highest amplitude SERS spectra. Moreover, we demonstrate the possibility of automated selection of suitable morphological parameters to obtain the high-amplitude spectra. The developed AFM data auto-analysis procedures are used for smart optimization of SERS-active substrates nanoengineering processes.