In this study, the high-efficiency phase control Si metasurfaces are investigated based on aperiodic nanoarrays unlike widely-used period structures, the aperiodicity of which providing additional freedom to improve metasurfaces’ performance. Firstly, the phase control mechanism of Huygens nanoblocks is demonstrated, particularly the internal electromagnetic resonances and the manipulation of effective electrical/magnetic polarizabilities. Then, a group of high-transmission Si nanoblocks with 2π phase control is sought by sweeping the geometrical parameters. Finally, several metasurfaces, such as grating and parabolic lens, are numerically realized by the nanostructures with high efficiency. The conversion efficiency of the grating reaches 80%, and the focusing conversion efficiency of the metalens is 99.3%. The results show that the high-efficiency phase control metasurfaces can be realized based on aperiodic nanoarrays, i.e., additional design freedom.

Femtosecond laser processing technology is an advanced sub-micro-processing technique that enables the non-contact processing of various materials. This technology can be used to apply sub-micro structures for purposes such as hydrophilicity enhancement, optical transmittance improvement, and photonics detection. However, when it comes to processing micro/nanostructures on highly brittle materials using femtosecond lasers, there are challenges such as low processing efficiency, generation of debris, and microcracking. In this paper, we propose a method called the out-of-focus femtosecond laser direct writing technique combined with wet etching. This method offers simplicity, speed, and flexibility in preparing dense, large-area sub-microstructured surfaces on the brittle material sapphire. Our detailed investigation focuses on the impact of laser processing parameters (direct writing period, distance of focusing, direct writing speed, etc.) on the sub-microstructures of Al₂O₃ surfaces. The results demonstrate that this method successfully creates embedded sub-microstructures on the sapphire surface. The microholes, with a diameter of approximately 2.0 μm, contain sub-micro structures with a minimum width of 250 ± 20 nm. Additionally, we conducted experiments to assess the optical transmittance of sapphire nanostructures in the range of 350–1200 nm, which exhibited an average transmittance of approximately 77.0%. The water contact angle (CA) test yielded a result of 52 ± 2°, indicating an enhancement in the hydrophilicity of the sapphire nanostructures with only a slight reduction in optical transmittance. Our efficient fabrication of sub-microstructures on the sapphire surface of highly brittle materials offers a promising method for the production and application of brittle materials in the field of micro-optics.

A femtosecond laser raster-type in situ repetitive direct writing technique was used for the fabrication of anti-reflective microhole structures in Germanium (Ge) in the visible near-infrared range (300–1800 nm). This technique builds a layer of microstructured arrays on the surface of Ge, enabling Ge to exhibit excellent anti-reflective properties. The large-area micro-nanostructures of Ge were fabricated using femtosecond laser raster-type in situ repetitive direct writing. Ge microstructures are characterized by their structural regularity, high processing efficiency, high reproducibility, and excellent anti-reflective properties. Experimental test results showed that the average reflectance of the Ge microporous structure surface in the range of 300–1800 nm was 2.25% (the average reflectance of flat Ge was 41.5%), and the lowest reflectance was ~1.6%. This microstructure fabrication drastically reduced the optical loss of Ge, thus enhancing the photothermal utilization of Ge. The many nanoburrs and voids in the Ge microporous structure provided excellent hydrophobicity, with a hydrophobicity angle of up to 133 ± 2° (the hydrophobicity angle of flat Ge was 70 ± 2°). The high hydrophobicity angle allows for strong and effective self-cleaning performance. The femtosecond laser raster-type in situ repeatable direct writing technology has many desirable properties, including simplicity, high accuracy, flexibility, and repeatability, that make it one of the preferred choices for advanced manufacturing. The Ge micro-nanostructured arrays with excellent optical anti-reflective properties and hydrophobicity have become an attractive alternative to the current photo-thermal absorbers. It is expected to be used in many applications such as solar panels, photovoltaic sensors, and other optoelectronic devices.

The reflective optical multi-films with high damage thresholds are widely used in intense-light systems. Metasurfaces, which can manipulate light peculiarly, give a new approach to achieve highly reflective films by a single-layer configuration. In this study, reflective metasurfaces, composed of silicon nanoholes, are numerically investigated to achieve high damage thresholds. These nanoholes can confine the strongest electric field into the air zone, and, subsequently, the in-air electric field does not interact directly with silicon, attenuating the optothermal effect that causes damage. Firstly, the geometrical dependencies of silicon nanoholes’ reflectance and field distribution are investigated. Then, the excitation states of electric/magnetic dipoles in nanostructures are analyzed to explain the electromagnetic mechanism. Furthermore, the reflection dependences of the nanostructures on wavelength and incident angle are investigated. Finally, for a typical reflective meta-film, some optothermal simulations are conducted, in which a maximum laser density of 0.27 W/µm² can be handled. The study provides an approach to improve the laser damage threshold of reflective nanofilms, which can be exploited in many intense-light applications.

Three-dimensional (3D) plasmonic metamaterials have become a trend in the application of nanophotonic devices. In this paper, a convenient and inexpensive method for the design of 3D multilayer plasmonic metamaterials is constructed using a one-step self-shielded reactive-ion-etching process (OSRP) and a thermal evaporation system, which provides an efficient and low-cost method for the preparation of surface-enhanced Raman spectroscopy (SERS) substrates. The near-field enhancement of the 3D plasmonic metamaterials provides highly efficient electromagnetic resonance, and highly sensitive and uniform SERS sensing capabilities. The SERS detection results of rhodamine B (Rh. B) and rhodamine 6G (R6G) on this substrate show that the detection limit could reach 10^–13 mol/L, and the signal could give expression to excellent uniform stability. The results show that high sensitivity and high robustness SERS substrates can be prepared with high efficiency and low cost.