The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable: custom design and solutions for specific applications will dominate future development (Fritze in: Panning EM, Liddle JA (eds) Novel patterning technologies. International society for optics and photonics. SPIE, Bellingham, 2021. 10.1117/12.2593229). For this reason, new aspects arise for future lithography, which is why enormous effort has been directed to the development of alternative fabrication technologies. Yet, the technologies emerging from this process, which are promising for coping with the current resolution and accuracy challenges, are only demonstrated as a proof-of-concept on a lab scale of several square micrometers. Such scale is not adequate for the requirements of modern lithography; therefore, there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies. Similar challenges arise because of the technical progress in various other fields, realizing new and unique functionalities based on nanoscale effects, e.g., in nanophotonics, quantum computing, energy harvesting, and life sciences. Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks, which are available at the Technische Universität Ilmenau in the form of nanopositioning and nanomeasuring (NPM) machines. With this equipment, the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters.

This paper deals with a planar nanopositioning and -measuring machine, the so-called nanofabrication machine (NFM-100), in combination with a mounted atomic force microscope (AFM). This planar machine has a circular moving range of 100 mm. Due to the possibility of detecting structures in the nanometre range with an atomic force microscope and the large range of motion of the NFM-100, structures can be analysed with high resolution and precision over large areas by combining the two systems, which was not possible before. On the basis of a grating sample, line scans over lengths in the millimetre range are demonstrated on the one hand; on the other hand, the accuracy as well as various evaluation methods are discussed and analysed.

This work deals with various investigations into the accuracy of a newly developed planar nanopositioning machine. This machine, called Nanofabrication Machine 100 (NFM-100), has a positioning range of 100 mm in diameter. To determine the precision, various movement scenarios are performed with the machine table, and the trajectory deviation from the set trajectory is determined. In particular, the focus is on high velocities of up to 20 mm/s. Even at high speeds in the range of several millimetres per second, this machine can impress with its performance and only has a deviation in the nanometre range.

Since the turn of the millennium, the development and commercial availability of optical frequency combs has led to a steadily increase of worldwide installed frequency combs and a growing interest in using them for industrial-related metrology applications. Especially, GPS-referenced frequency combs often serve as a “self-calibrating” length standard for laser wavelength calibration in many national metrology institutes with uncertainties better than u = 1 × 10⁻¹¹. In this contribution, the application of a He-Ne laser source permanently disciplined to a GPS-referenced frequency comb for the interferometric measurements in a nanopositioning machine with a measuring volume of 200 mm × 200 mm × 25 mm (NPMM-200) is discussed. For this purpose, the frequency stability of the GPS-referenced comb is characterized by heterodyning with a diode laser referenced to an ultrastable cavity. Based on this comparison, an uncertainty of u = 9.2 × 10⁻¹² (τ = 8 s, k = 2) for the GPS-referenced comb has been obtained. By stabilizing a tunable He-Ne source to a single comb line, the long-term frequency stability of the comb is transferred onto our gas lasers increasing their long-term stability by three orders of magnitude. Second, short-term fluctuations-related length measurement errors were reduced to a value that falls below the nominal resolving capabilities of our interferometers (ΔL/L = 2.9 × 10⁻¹¹). Both measures make the influence of frequency distortions on the interferometric length measurement within the NPMM-200 negligible. Furthermore, this approach establishes a permanent link of interferometric length measurements to an atomic clock.

This contribution deals with the analysis of the positioning accuracy of a new Nano Fabrication Machine. This machine uses a planar direct drive system and has a positioning range up to 100 mm in diameter. The positioning accuracy was investigated in different movement scenarios, including phases of acceleration and deceleration. Also, the target position error of certain movements at different positions of the machine slider is considered. Currently, the NFM-100 is equipped with a tip-based measuring system. This Atomic Force Microscope (AFM) uses self-actuating and self-sensing microcantilevers, which can be used also for Field-Emission-Scanning-Probe-Lithography (FESPL). This process is capable of fabricating structures in the range of nanometres. In combination with the NFM-100 and its positioning range, nanostructures can be analysed and written in a macroscopic range without any tool change. However, the focus in this article is on the measurement and positioning accuracy of the tip-based measuring system in combination with the NFM-100 and is verified by repeated measurements. Finally, a linescan, realised using both systems, is shown over a long range of motion of 30 mm.

This paper describes a standing-wave interferometer with two laser sources of different wavelengths, diametrically opposed and emitting towards each other. The resulting standing wave has an intensity profile which is moving with a constant velocity, and is directly detected inside the laser beam by two thin and transparent photo sensors. The first sensor is at a fixed position, serving as a phase reference for the second one which is moved along the optical axis, resulting in a frequency shift, proportional to the velocity. The phase difference between both sensors is evaluated for the purpose of interferometric length measurements.