Nanopositioning and nanomeasuring machines (NPM-machines), developed at Technische Universität Ilmenau, have provided high-precision measurement and positioning of objects across ten decades, from 20 pm resolution up to 200 mm measuring range. They work on the basis of the error-minimal, extended six degrees of freedom Abbe-comparator principle, with high-precision fibre-coupled laser interferometers and optical or atomic force probes. These machines are suitable not only for measuring but also for positioning with an outstanding sub-nanometre performance. Measurements on precision step heights up to 5 mm show a repeatability of 20 pm. Consecutive step positioning of 80 pm can be demonstrated. With the new approach of an atomic clock-stabilized He–Ne-laser via a high-stable-frequency comb, we achieve a frequency stability of less than 300 Hz, respectively 0.6 ċ 10⁻¹² relative frequency stability within 1 h at an integration time of 1 s. For the first time, we can demonstrate a direct, permanent and unbroken chain of traceability between the laser interferometric measurement within an NPM-machine and a GPS satellite-based atomic clock. This paper presents a closer insight into the scientific and metrological background as well as unrivalled measurement results, and discusses the great possibilities of this new technology.

Although optical 3D topography measurement instruments are widespread, measured profiles suffer from systematic deviations occurring due to the wave characteristics of light. These deviations can be analyzed by numerical simulations. We present a 3D modeling of the image formation of confocal microscopes. For this, the light-surface interaction is simulated using two different rigorous methods, the finite element method and the rigorous coupled-wave analysis. The image formation in the confocal microscope is simulated using a Fourier optics approach. The model provides high accuracy and advantages with respect to the computational effort as a full 3D model is applied to 2D structures and the lateral scanning process of the confocal microscope is considered without repeating the time consuming rigorous simulation of the scattering process. The accuracy of the model is proved considering different deterministic surface structures, which usually cause strong systematic deviations in measurement results. Further, the influences of apodization and a finite pinhole size are demonstrated.

Micro coordinate measuring machines have been developed for the traceable characterization of small complex parts, due to the demand in research and industry. These machines require geometrically well characterized probing spheres of ever smaller radii. Currently, there is no established procedure for the measurement of such spheres below radii of 500 µm. In this paper we, therefore, propose and investigate an approach which is based on a set of atomic force microscope (AFM) surface scans in conjunction with a stitching algorithm. The strategy was implemented on a nano measuring machine and investigated on a ruby sphere with a radius of 150 µm. Although the strategy can generally be applied to the characterization of a full sphere, we limit ourselves to the measurement of one great circle (equator). The technique enables the measurement of micro spheres with a high lateral and vertical resolution. The mean radius of the ruby sphere was measured with a standard deviation of 3.7 nm over six repetitions. As our experiments have shown, the measurement procedure is at the moment mainly influenced by the shape of the AFM tip which requires further attention.

This paper deals with a planar nanopositioning and -measuring machine, the so-called nanofabrication machine (NFM-100), in combination with a mounted atomic force microscope (AFM). This planar machine has a circular moving range of 100 mm. Due to the possibility of detecting structures in the nanometre range with an atomic force microscope and the large range of motion of the NFM-100, structures can be analysed with high resolution and precision over large areas by combining the two systems, which was not possible before. On the basis of a grating sample, line scans over lengths in the millimetre range are demonstrated on the one hand; on the other hand, the accuracy as well as various evaluation methods are discussed and analysed.

This work deals with various investigations into the accuracy of a newly developed planar nanopositioning machine. This machine, called Nanofabrication Machine 100 (NFM-100), has a positioning range of 100 mm in diameter. To determine the precision, various movement scenarios are performed with the machine table, and the trajectory deviation from the set trajectory is determined. In particular, the focus is on high velocities of up to 20 mm/s. Even at high speeds in the range of several millimetres per second, this machine can impress with its performance and only has a deviation in the nanometre range.