The purpose of this work was to deposit Zn-containing films on Si substrates using the commercial atmospheric pressure plasma jet “kINPen’09.” In preliminary experiments Zn-containing films were deposited on the silicon substrates immersed in water solutions of Zn(NO₃)₂•6H₂O salt. The surface composition of deposited films was analyzed by the XPS (X-ray photoelectron spectroscopy) technique while the bulk composition was studied by means of XRD (X-ray diffraction) mesurements. The film thickness was measured by a profilometer. We have determined that the concentration of the zinc nitrate solution as well as changes in the deposition time resulted in a large fluctuation of the deposited film thickness. However, the successful deposition of the Zn-containing films on the Si substrate was definitely confirmed.

Excellent adhesion of electrospun nanofiber (NF) to textile support is crucial for a broad range of their bioapplications, e.g., wound dressing development. We compared the effect of several low- and atmospheric pressure plasma modifications on the adhesion between two parts of composite—polycaprolactone (PCL) nanofibrous mat (functional part) and polypropylene (PP) spunbond fabric (support). The support fabrics were modified before electrospinning by low-pressure plasma oxygen treatment or amine plasma polymer thin film or treated by atmospheric pressure plasma slit jet (PSJ) in argon or argon/nitrogen. The adhesion was evaluated by tensile test and loop test adapted for thin NF mat measurement and the trends obtained by both tests largely agreed. Although all modifications improved the adhesion significantly (at least twice for PSJ treatments), low-pressure oxygen treatment showed to be the most effective as it strengthened adhesion by a factor of six. The adhesion improvement was ascribed to the synergic effect of high treatment homogeneity with the right ratio of surface functional groups and sufficient wettability. The low-pressure modified fabric also stayed long-term hydrophilic (ten months), even though surfaces usually return to a non-wettable state (hydrophobic recovery). In contrast to XPS, highly surface-sensitive water contact angle measurement proved suitable for monitoring subtle surface changes.

Optical emission spectroscopy, fast intensified CCD imaging and electrical measurements were applied to investigate the basic plasma parameters of surface barrier discharge emerging from a conductive water electrode. The discharge was generated at the triple-line interface of atmospheric pressure argon gas and conductive water solution at the fused silica dielectrics using a sinusoidal high-voltage waveform. The spectroscopic methods of atomic line broadening and molecular spectroscopy were used to determine the electron densities and the gas temperature in the active plasma. These parameters were obtained for both applied voltage polarities and resolved spatially. Two different spectral signatures were identified in the spatially resolved spectra resulting in electron densities differing by two orders of magnitude. It is shown that two discharge mechanisms take a place: the streamer and the leader one, with electron densities of 10 ¹⁴ and 10 ¹⁶ cm ⁻³ , respectively. This spectroscopic evidence is supported by the combined diagnostics of electrical current measurements and phase-resolved intensified CCD camera imaging.

A study of plasma treatment of clay-coated paper is presented. The wettability of the paper surface before and after the plasma treatment was determined by measuring the water contact angle and surface free energy. The appearance of the surface-functional groups was determined by using high-resolution X-ray photoelectron spectroscopy, while changes in the surface morphology were monitored by scanning electron microscopy. Already after 0.25 s of the plasma treatment, the paper surface improved its wettability. The X-ray photoelectron spectroscopy analyses showed a gradual increase of oxygen-rich functional groups on the surface while scanning electron microscopy analyses did not show a significant modification of the morphology and no alternation of the surface structure after the plasma treatment.