Heteroepitaxy of III–V compound semiconductors on industry standard (001) silicon (Si) substrates is highly desirable for large-scale electronic and photonic integrated circuits. Challenges of this approach relate primarily to lattice, polarity, and coefficient of thermal expansion mismatch, which ultimately generate a high density of defects and limit the reliability of active devices. Ongoing efforts to monolithically integrate lasers in silicon photonics include leveraging quantum dots for reduced sensitivity to defects and the ability to enable 1310 nm lasers with gallium arsenide (GaAs) and related compounds. In this work, to extend the operation window to the widely used 1550 nm telecommunications region, we have demonstrated continuous-wave (CW) electrically pumped indium phosphide (InP)-based quantum well lasers on complementary metal-oxide-semiconductor (CMOS)-compatible (001) Si. Heteroepitaxy of InP and related compounds on Si poses additional challenges because the lattice mismatch is significantly larger compared to GaAs. Key to our approach is the development of a low dislocation density InP-on-Si template by metalorganic chemical vapor deposition (MOCVD). Following an InP buffer with a surface defect density of ${1.15} \times {{10}^8}/{{\rm cm}^2}$, a seven-layer indium gallium arsenide phosphide (InGaAsP) multi-quantum well laser diode structure was grown. Fabry–Perot ridge waveguide lasers were then fabricated. A 20-µm wide and 1000-µm long laser demonstrates a room temperature continuous-wave (CW) lasing threshold current density of ${2.05}\;{{\rm kA}/{\rm cm}^2}$ and a maximum output power of 18 mW per facet without facet coating. CW lasing up to 65°C and pulsed lasing greater than 105°C were achieved. This MOCVD-based heteroepitaxy approach offers a practical path toward monolithic integration of InP lasers in silicon photonics.

Realization of fully integrated silicon photonics has been handicapped by the lack of a reliable and efficient III-V light source on Si. Specifically, electrically pumped continuous wave (CW) lasing and operation sustainable at high temperatures are critical for practical applications. Here, we present the first electrically pumped room temperature (RT) CW lasing results of 1.55 μm quantum dash (QDash) lasers directly grown on patterned on-axis (001) Si using metal organic chemical vapor deposition (MOCVD). Adopting a dash-in-well structure as the active medium, the growth of QDash was optimized on an InP on Si template. Incorporating the advantages of the optimized material growth and device fabrication, good laser performance including a low threshold current of 50 mA, a threshold current density of 1.3 kA/cm² and operation at elevated temperature up to 59 °C in CW mode was achieved. Comparison of lasers grown on Si and native InP substrates in the same growth run was made. Based on the laser characteristics measured at room temperature and elevated temperatures, the QDash quality on the two substrates is comparable. These results suggest that MOCVD is a viable technique for lasers on Si growth and represent an advance towards silicon-based photonic-electronic integration and manufacturing.

We report self-assembled InAs/GaAs quantum dots (QDs) grown on a specially engineered GaAs-on-V-grooved-Si substrate by metal-organic vapor phase epitaxy. Recessed pockets formed on V-groove patterned Si (001) substrates were used to prevent most of the hetero-interfacial stacking faults from extending into the upper QD active region. 1.3 μm room temperature emission from high-density (5.6 × 10¹⁰cm⁻²) QDs has been obtained, with a narrow full-width-at-half-maximum of 29 meV. Optical quality of the QDs was found to be better than those grown on conventional planar offcut Si templates, as indicated by temperature-dependent photoluminescence analysis. Results suggest great potential to integrate QD lasers on a Si complementary-metal-oxide-semiconductor compatible platform using such GaAs on Si templates.

We have developed InP based 1.55 μm lasers epitaxially grown on (001) Si substrates for photonics integration. To overcome the fundamental material challenges associated with mismatch III-V on Si hetero-epitaxy, a Si V-groove epitaxy platform was established, leading to device quality III-V nanostructures and thin films. Combining metal organic chemical vapor deposition (MOCVD) grown 1.55 μm InAs QDs and the InP/Si thin film templates, we have achieved electrically driven 1.55 μm QD lasers on Si operating at room-temperature. To reduce device footprint and energy consumption, a buffer-less integration path by growing InP nano-ridge lasers on pre-patterned silicon-on-insulators (SOI) wafers has been explored. Material and device characterizations and an outlook for device component integration is discussed.