Optimization of thin film uniformity is an important aspect for large-area coatings, particularly for optical coatings where error tolerances can be of the order of nanometers. Physical vapor deposition is a widely used technique for producing thin films. Applications include anti-reflection coatings, photovoltaics etc. This paper reviews the methods and simulations used for improving thin film uniformity in physical vapor deposition (both evaporation and sputtering), covering characteristic aspects of emission from material sources, projection/mask effects on film thickness distribution, as well as geometric and rotational influences from apparatus configurations. Following the review, a new program for modelling and simulating thin film uniformity for physical vapor deposition was developed using MathCAD. Results from the program were then compared with both known theoretical analytical equations of thickness distribution and experimental data, and found to be in good agreement. A mask for optimizing thin film thickness distribution designed using the program was shown to improve thickness uniformity from ±4% to ±0.56%.

The use of Raman spectroscopy combined with saliva is an exciting emerging spectroscopy-biofluid combination. In this review, we summarize current methods employed in such studies, in particular the collection, pretreatment, and storage of saliva, as well as measurement procedures and Raman parameters used. Given the need for sensitive detection, surface-enhanced Raman methods are also surveyed, alongside chemometric techniques. A meta-analysis of variables is compiled. We observe a wide range of approaches and conclude that standardization of methods and progress to more extensive validation Raman-saliva studies is necessary. Nevertheless, the studies show tremendous promise toward the improvement of speed, diagnostic accuracy, and portable device possibilities in applications such as healthcare, law enforcement, and forensics.

A comprehensive guide to selecting the optimum laser wavelength in Raman spectroscopy experiments.

Surface Enhanced Raman Spectroscopy presents a rapid, non-destructive method to identify chemical and biological samples with up to single molecule sensitivity. Since its discovery in 1974, the technique has become an intense field of interdisciplinary research, typically generating >2000 publications per year since 2011. The technique relies on the localised surface plasmon resonance phenomenon, where incident light can couple with plasmons at the interface that result in the generation of an intense electric field. This field can propagate from the surface from the metal-dielectric interface, so molecules within proximity will experience more intense Raman scattering. Localised surface plasmon resonance wavelength is determined by a number of factors, such as size, geometry and material. Due to the requirements of the surface optical response, Ag and Au are typical metals used for surface enhanced Raman applications. These metals then need to have nano features that improve the localised surface plasmon resonance, several variants of these substrates exist; surfaces can range from nanoparticles in a suspension, electrochemically roughened electrodes to metal nanostructures on a substrate. The latter will be the focus of this review, particularly reviewing substrates made by oblique angle deposition. Oblique angle deposition is the technique of growing thin films so that the material flux is not normal to the surface. Films grown in this fashion will possess nanostructures, due to the atomic self-shadowing effect, that are dependent mainly on the deposition angle. Recent developments, applications and highlights of surface enhanced Raman scattering substrates made by oblique angle deposition will be reviewed.