Plasmonic photodetection based on the hot-electron generation in nanostructures is a promising strategy for sub-band detection due to the high conversion efficiencies; however, it is plagued with the high dark current. In this paper, we have demonstrated the plasmonic photodetection with dark current suppression to create a Si-based broadband photodetector with enhanced performance in the short-wavelength infrared (SWIR) region. By hybridizing a 3 nm Au layer with the spherical Au nanoparticles (NPs) formed by rapid thermal annealing (RTA) on Si substrate, a well-behaved ITO/Au/Au NPs/n-Si Schottky photodetector with suppressed dark current and enhanced absorption in the SWIR region is obtained. This optimized detector shows a broad detection beyond 1200 nm and a high responsivity of 22.82 mA/W at 1310 nm at −1 V, as well as a low dark current density on the order of 10⁻⁵ A/cm². Such a Si-based plasmon-enhanced detector with desirable performance in dark current will be a promising strategy for realization of the high SNR detector while keeping fabrication costs low.

In recent years, all-inorganic cesium lead bromide (CsPbBr₃) perovskites have garnered considerable attention for their prospective applications in green photonics and optoelectronic devices. However, the development of efficient and economical methods to obtain high-quality micron-sized single-crystalline CsPbBr₃ microplatelets (MPs) has become a challenge. Here, we report the synthesis of CsPbBr₃ MPs on Si/SiO₂ substrate by optimizing the ultrafast antisolvent method (FAS). This technique is able to produce well-dispersed, uniformly sized, and morphologically regular tetragonal phase single crystals, which can give strong green emission at room temperature, with excellent stability and excitonic character. Moreover, the crystals demonstrated lasing with a whispering gallery mode with a low threshold. These results suggest that the single-crystalline CsPbBr₃ MPs synthesized by this method are of high optical quality, holding vast potential for future applications in photonic devices.

Porous silicon-based photodetectors have attracted more researches due to their high luminous efficiency, good stability and low cost. In this paper, a PbS quantum dots/porous silicon hybrid structure has been fabricated. The PbS quantum dots (QDs) partly infiltrated into the porous silicon (PSi) layer and partly deposited on its surface, which could increase the absorption of near-infrared wavelength range and extend the light absorption in silicon for wavelengths longer than 1100 nm. After that, A metal-semiconductor-metal (MSM) device is fabricated and its response spectrum could extend to the 1200 nm at -3 V. As a silicon-based photodetector (PD), one can envision its role for operation from visible light to short-wavelength infrared range.