This paper presents the optimization design of a miniaturized five-element wide-angle fisheye lens using a deep learning algorithm. Zemax optical design software was used to simulate and optimize the wide-angle fisheye lens. A deep learning algorithm helped to find the best combination of different lens materials. We first used six lens elements as an initial configuration to design miniaturized wide-angle fisheye lenses using the optimization process. The optical system components were gradually decreased to five lens elements. Both OKP4HT and polymethyl methacrylate (PMMA) plastic aspheric lenses were selected to replace the second spherical glass lens in the original design. We propose two types of wide-angle fisheye lens designs with four spherical lenses and one aspheric lens. The results for these designs indicated a viewing angle of 174°, a total length of less than 15 mm, a spot size of less than 6 μm, lateral color within ±1 μm, field curvature within ±0.02 mm, and F-θ distortion of ±3.5%. In addition, the MTF value was larger than 0.4 at the spatial frequency of 100 cycles/mm.

This study aims to investigate the thermomechanical properties of vanadium dioxide (VO₂) thin films. A VO₂ thin film was simultaneously deposited on B270 and H-K9L glass substrates by electron-beam evaporation with ion-assisted deposition. Based on optical interferometric methods, the thermal–mechanical behavior of and thermal stresses in VO₂ films can be determined. An improved Twyman–Green interferometer was used to measure the temperature-dependent residual stress variations of VO₂ thin films at different temperatures. This study found that the substrate has a great impact on thermal stress, which is mainly caused by the mismatch in the coefficient of thermal expansion (CTE) of the film and the substrate. By using the dual-substrate method, thermal stresses in VO₂ thin films from room temperature to 120 °C can be evaluated. The thermal expansion coefficient is 3.21 × 10⁻⁵ °C⁻¹, and the biaxial modulus is 517 GPa.

The undoped and tungsten (W)-doped vanadium dioxide (VO₂) thin films were prepared by electron beam evaporation associated with ion-beam-assisted deposition (IAD). The influence of different W-doped contents (3–5%) on the electrical, optical, structural, and thermo-mechanical properties of VO₂ thin films was investigated experimentally. Spectral transmittance results showed that with the increase in W-doped contents, the transmittance in the visible light range (400–750 nm) decreases from 60.2% to 53.9%, and the transmittance in the infrared wavelength range (2.5 μm to 5.5 μm) drops from 55.8% to 15.4%. As the W-doped content increases, the residual stress in the VO₂ thin film decreases from −0.276 GPa to −0.238 GPa, but the surface roughness increases. For temperature-dependent spectroscopic measurements, heating the VO₂ thin films from 30 °C to 100 °C showed the most significant change in transmittance for the 5% W-doped VO₂ thin film. When the heating temperature exceeds 55 °C, the optical transmittance drops significantly, and the visible light transmittance drops by about 11%. Finally, X-ray diffraction (XRD) and scanning electron microscope (SEM) were used to evaluate the microstructure characteristics of VO₂ thin films.

This study presents a multilayer design and fabrication of an optical notch filter for enhancing visual quality. A cost-effective multilayer design of notch filter with low surface roughness and low residual stress is proposed. A 9-layer notch filter composed of SiO₂ and Nb₂O₅ with a central wavelength of 480 nm is prepared by electron beam evaporation combined with ion-assisted deposition. The optical transmittance, residual stress, and surface morphology are measured by a UV/VIS/NIR spectrophotometer, Twyman-Green interferometer and field emission scanning electron microscopy (FE-SEM). The transmittance of the notch filter at the central wavelength is above 15%, and the average transmittance of the transmission band is about 80%. The residual stress of the notch filter is −0.235 GPa, and the root mean square surface roughness is 1.85 nm. For improving the visual quality, a good image contrast can be obtained by observing the microscopic image using the proposed notch filter.

This study presents the optimal process parameters of zirconium nitride (ZrN) thin films prepared by ion-assisted deposition (IAD) technology combined with electron-beam evaporation based on plasma surface treatment and the Taguchi method. We use Minitab statistical software (Version 20.2.0) and L9 orthogonal array parameter design combined with the response surface method (RSM). The quadratic polynomial regression equation was optimized by the RSM. Based on the control factor screening test of the Taguchi method, we determined the most critical factor combination for the process and derived the optimized process parameters of the ZrN thin films. In the coating experiments, we successfully achieved the optimal combination of good refractive index, adequate residual stress, and lower surface roughness on B270 glass substrates. These results indicate that the optimized preparation process can simultaneously achieve several desirable properties, improving the performance and application of ZrN thin films. Furthermore, our research method not only reduces the number of experiments and costs but also improves the efficiency of research and development. By screening key factors and optimizing process parameters, we can find the best process parameter more rapidly, reduce the demand for expenses given materials and equipment costs, and contribute to improving the electron-beam evaporation process. According to the experimental results, it can be observed that under certain conditions, the properties of ZrN thin films reached optimal values. These results are highly useful for optimizing the process parameters of ZrN thin films and provide a basis for further improvement of the thin film properties.

The undoped and tungsten (W)-doped vanadium dioxide (VO₂) thin films were prepared by electron beam evaporation associated with ion-beam assisted deposition (IAD). The influence of different W-doped contents (3%-5%) on the optical, electrical, structural, and thermos-mechanical properties of VO₂ thin films was investigated experimentally. Spectral transmittance results showed that with the increase of W-doped contents, the transmittance in the visible light range (400-750 nm) decreases from 60.2% to 53.9%, and the transmittance in the infrared wavelength range (2.5 μm to 5.5 μm) drops from 55.8% to 15.4%. As the W-doped content increases, the residual stress in the VO₂ thin film decreases from -0.276 GPa to -0.238 GPa, but the surface roughness increases. For temperature-dependent spectroscopic measurements, heating the VO2 thin films from 30°C to 100°C showed the most significant change in transmittance for the 5% W-doped VO₂ thin film. When the heating temperature exceeds 55°C, the optical transmittance drops significantly, and the visible light transmittance drops by about 11%. Finally, X-ray Diffraction (XRD) and scanning electron microscope (SEM) were used to evaluate the microstructure characteristics of VO₂ thin films.