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CrWN coatings were fabricated through a hybrid high-power impulse magnetron sputtering/radio-frequency magnetron sputtering technique. The phase structures, mechanical properties, and tribological characteristics of CrWN coatings prepared with various nitrogen flow ratios (fN2s) were investigated. The results indicated that the CrWN coatings prepared at fN2 levels of 0.1 and 0.2 exhibited a Cr2N phase, whereas the coatings prepared at fN2 levels of 0.3 and 0.4 exhibited a CrN phase. These CrWN coatings exhibited hardness values of 16.7–20.2 GPa and Young’s modulus levels of 268–296 GPa, which indicated higher mechanical properties than those of coatings with similar residual stresses prepared through conventional direct current magnetron sputtering. Face-centered cubic (fcc) Cr51W2N47 coatings with a residual stress of −0.53 GPa exhibited the highest wear and scratch resistance. Furthermore, the diffusion barrier performance of fcc CrWN films on Cu metallization was explored, and they exhibited excellent barrier characteristics up to 650 °C.
Li-Chun Chang; Cheng-En Wu; Tzu-Yu Ou. Mechanical Properties and Diffusion Barrier Performance of CrWN Coatings Fabricated through Hybrid HiPIMS/RFMS. Coatings 2021, 11, 690 .
AMA StyleLi-Chun Chang, Cheng-En Wu, Tzu-Yu Ou. Mechanical Properties and Diffusion Barrier Performance of CrWN Coatings Fabricated through Hybrid HiPIMS/RFMS. Coatings. 2021; 11 (6):690.
Chicago/Turabian StyleLi-Chun Chang; Cheng-En Wu; Tzu-Yu Ou. 2021. "Mechanical Properties and Diffusion Barrier Performance of CrWN Coatings Fabricated through Hybrid HiPIMS/RFMS." Coatings 11, no. 6: 690.
In this study, we propose a 5-bit X-band gallium nitride (GaN) high electron mobility transistor (HEMT)-based phased shifter monolithic microwave integrated circuit for a phased-array technique. The design includes high-pass/low-pass networks for the 180° phase bit, two high-pass/bandpass networks separated for the 45° and 90° phase bits, and two transmission lines based on traveling wave switch and capacitive load networks that are separated for the 11.25° and 22.5° phase bits. The state-to-state variation in the insertion loss is 11.8 ± 3.45 dB, and an input/output return loss of less than 8 dB was obtained in a frequency range of 8–12 GHz. Moreover, the phase shifter achieved a low root mean square (RMS) phase error and RMS amplitude error of 6.23° and 1.15 dB, respectively, under the same frequency range. The measured input-referred P1dB of the five primary phase shift states were larger than 29 dBm at 8 GHz. The RMS phase error and RMS amplitude error slightly increased when the temperature increased from 25 to 100 °C. The on-chip phase shifter exhibited no dc power consumption and occupied an area of 2 × 3 mm2.
Hsien-Chin Chiu; Chun-Ming Chen; Li-Chun Chang; Hsuan-Ling Kao. A 5-Bit X-Band GaN HEMT-Based Phase Shifter. Electronics 2021, 10, 658 .
AMA StyleHsien-Chin Chiu, Chun-Ming Chen, Li-Chun Chang, Hsuan-Ling Kao. A 5-Bit X-Band GaN HEMT-Based Phase Shifter. Electronics. 2021; 10 (6):658.
Chicago/Turabian StyleHsien-Chin Chiu; Chun-Ming Chen; Li-Chun Chang; Hsuan-Ling Kao. 2021. "A 5-Bit X-Band GaN HEMT-Based Phase Shifter." Electronics 10, no. 6: 658.
The reactive gas flow ratio and substrate bias voltage are crucial sputtering parameters for fabricating transition metal nitride films. In this study, W–N films were prepared using sputtering with nitrogen flow ratios (f) of 0.1–0.5. W–N and W–Si–N films were then prepared using an f level of 0.4 and substrate bias varying from 0 to −150 V by using sputtering and co-sputtering, respectively. The variations in phase structures, bonding characteristics, mechanical properties, and wear resistance of the W–N and W–Si–N films were investigated. The W–N films prepared with nitrogen flow ratios of 0.1–0.2, 0.3, and 0.4–0.5 displayed crystalline W, amorphous W–N, and crystalline W2N, respectively. The W–N films prepared using a nitrogen flow ratio of 0.4 and substrate bias voltages of −50 and −100 V exhibited favorable mechanical properties and high wear resistance. The mechanical properties of the amorphous W–Si–N films were not related to the magnitude of the substrate bias.
Li-Chun Chang; Ming-Ching Sung; Li-Heng Chu; Yung-I Chen. Effects of the Nitrogen Flow Ratio and Substrate Bias on the Mechanical Properties of W–N and W–Si–N Films. Coatings 2020, 10, 1252 .
AMA StyleLi-Chun Chang, Ming-Ching Sung, Li-Heng Chu, Yung-I Chen. Effects of the Nitrogen Flow Ratio and Substrate Bias on the Mechanical Properties of W–N and W–Si–N Films. Coatings. 2020; 10 (12):1252.
Chicago/Turabian StyleLi-Chun Chang; Ming-Ching Sung; Li-Heng Chu; Yung-I Chen. 2020. "Effects of the Nitrogen Flow Ratio and Substrate Bias on the Mechanical Properties of W–N and W–Si–N Films." Coatings 10, no. 12: 1252.
A fully inkjet-printed strain sensor based on carbon nanotubes (CNTs) was fabricated in this study for microstrain and microcrack detection. Carbon nanotubes and silver films were used as the sensing layer and conductive layer, respectively. Inkjet-printed CNTs easily undergo agglomeration due to van der Waals forces between CNTs, resulting in uneven films. The uniformity of CNT film affects the electrical and mechanical properties. Multi-pass printing and pattern rotation provided precise quantities of sensing materials, enabling the realization of uniform CNT films and stable resistance. Three strain sensors printed eight-layer CNT film by unidirectional printing, rotated by 180° and 90° were compared. The low density on one side of eight-layer CNT film by unidirectional printing results in more disconnection and poor connectivity with the silver film, thereby, significantly increasing the resistance. For 180° rotation eight-layer strain sensors, lower sensitivity and smaller measured range were found because strain was applied to the uneven CNT film resulting in non-uniform strain distribution. Lower resistance and better strain sensitivity was obtained for eight-layer strain sensor with 90° rotation because of uniform film. Given the uniform surface morphology and saturated sheet resistance of the 20-layer CNT film, the strain performance of the 20-layer CNT strain sensor was also examined. Excluding the permanent destruction of the first strain, 0.76% and 1.05% responses were obtained for the 8- and 20-layer strain sensors under strain between 0% and 3128 µε, respectively, which demonstrates the high reproducibility and recoverability of the sensor. The gauge factor (GF) of 20-layer strain sensor was found to be 2.77 under strain from 71 to 3128 µε, which is higher than eight-layer strain sensor (GF = 1.93) due to the uniform surface morphology and stable resistance. The strain sensors exhibited a highly linear and reversible behavior under strain of 71 to 3128 µε, so that the microstrain level could be clearly distinguished. The technology of the fully inkjet-printed CNT-based microstrain sensor provides high reproducibility, stability, and rapid hardness detection.
Hsuan-Ling Kao; Cheng-Lin Cho; Li-Chun Chang; Chun-Bing Chen; Wen-Hung Chung; Yun-Chen Tsai. A Fully Inkjet-Printed Strain Sensor Based on Carbon Nanotubes. Coatings 2020, 10, 792 .
AMA StyleHsuan-Ling Kao, Cheng-Lin Cho, Li-Chun Chang, Chun-Bing Chen, Wen-Hung Chung, Yun-Chen Tsai. A Fully Inkjet-Printed Strain Sensor Based on Carbon Nanotubes. Coatings. 2020; 10 (8):792.
Chicago/Turabian StyleHsuan-Ling Kao; Cheng-Lin Cho; Li-Chun Chang; Chun-Bing Chen; Wen-Hung Chung; Yun-Chen Tsai. 2020. "A Fully Inkjet-Printed Strain Sensor Based on Carbon Nanotubes." Coatings 10, no. 8: 792.
Zr-Si-N films with atomic ratios of N/(Zr + Si) of 0.54-0.82 were fabricated through high-power impulse magnetron sputtering (HiPIMS)-radio-frequency magnetron sputtering (RFMS) cosputtering by applying an average HiPIMS power of 300 W on the Zr target, various RF power levels on the Si target, and negative bias voltage levels of 0-150 V connected to the substrate holder. Applying a negative bias voltage on substrates enhanced the ion bombardment effect, which affected the chemical compositions, mechanical properties, and residual stress of the Zr-Si-N films. The results indicated that Zr-Si-N films with Si content ranging from 1.4 to 6.3 atom % exhibited a high hardness level of 33.2-34.6 GPa accompanied with a compressive stress of 4.3-6.4 GPa, an H/E* level of 0.080-0.107, an H3/E*2 level of 0.21-0.39 GPa, and an elastic recovery of 62-72%.
Yung-I Chen; Yu-Zhe Zheng; Li-Chun Chang; Yu-Heng Liu. Effect of Bias Voltage on Mechanical Properties of HiPIMS/RFMS Cosputtered Zr-Si-N Films. Materials 2019, 12, 2658 .
AMA StyleYung-I Chen, Yu-Zhe Zheng, Li-Chun Chang, Yu-Heng Liu. Effect of Bias Voltage on Mechanical Properties of HiPIMS/RFMS Cosputtered Zr-Si-N Films. Materials. 2019; 12 (17):2658.
Chicago/Turabian StyleYung-I Chen; Yu-Zhe Zheng; Li-Chun Chang; Yu-Heng Liu. 2019. "Effect of Bias Voltage on Mechanical Properties of HiPIMS/RFMS Cosputtered Zr-Si-N Films." Materials 12, no. 17: 2658.
Cr–Si–N coatings were prepared through reactive direct current magneton sputtering using a high N2/Ar flow ratio of 1. The addition of Si to improve the mechanical properties and oxidation resistance of Cr–N coatings was examined. The results indicated that the Cr–Si–N coatings with an Si content of 50 at % exhibited a cubic CrN phase with a columnar structure, whereas the coatings with 14 at % Si comprised of a nanocomposite structure, and the coatings with 16–18 at % Si were near-amorphous. The nanocomposite Cr32Si14N54 coating possessed hardness and Young’s modulus values of 17 and 209 GPa, respectively, accompanied with a hardness to effective Young’s modulus (H/E*) value of 0.077 and an elastic recovery (We) level of 55%—all the properties were highest within the as-deposited coating. The addition of Si was also beneficial to reduce the surface roughness and improve the oxidation resistance.
Li-Chun Chang; Yu-Heng Liu; Yung-I Chen. Mechanical Properties and Oxidation Behavior of Cr–Si–N Coatings. Coatings 2019, 9, 528 .
AMA StyleLi-Chun Chang, Yu-Heng Liu, Yung-I Chen. Mechanical Properties and Oxidation Behavior of Cr–Si–N Coatings. Coatings. 2019; 9 (8):528.
Chicago/Turabian StyleLi-Chun Chang; Yu-Heng Liu; Yung-I Chen. 2019. "Mechanical Properties and Oxidation Behavior of Cr–Si–N Coatings." Coatings 9, no. 8: 528.
Monolithic Hf–Si–N coatings and multilayered Hf–Si–N coatings with cyclical gradient concentration were fabricated using reactive direct current magnetron cosputtering. The structure of the Hf–Si–N coatings varied from a crystalline HfN phase, to a mixture of HfN and amorphous phases and to an amorphous phase with continuously increasing the Si content. The multilayered Hf48Si3N49 coatings exhibited a mixture of face-centered cubic and near-amorphous phases with a maximal hardness of 22.5 GPa, a Young’s modulus of 244 GPa and a residual stress of −1.5 GPa. The crystalline phase-dominant coatings exhibited a linear relationship between the hardness and compressive residual stress, whereas the amorphous phase-dominant coatings exhibited a low hardness level of 15–16 GPa; this hardness is close to that of Si3N4. Various oxides were formed after annealing of the Hf–Si–N coatings at 600 °C in a 1% O2–99% Ar atmosphere. Monoclinic HfO2 formed after Hf54N46 annealing and amorphous oxide formed for the oxidation-resistant Hf32Si19N49 coatings. The oxidation behavior with respect to the Si content was investigated by using transmission electron microscopy and X-ray photoelectron spectroscopy.
Li-Chun Chang; Bo-Wei Liu; Yung-I Chen. Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings. Coatings 2018, 8, 354 .
AMA StyleLi-Chun Chang, Bo-Wei Liu, Yung-I Chen. Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings. Coatings. 2018; 8 (10):354.
Chicago/Turabian StyleLi-Chun Chang; Bo-Wei Liu; Yung-I Chen. 2018. "Mechanical Properties and Oxidation Behavior of Multilayered Hf–Si–N Coatings." Coatings 8, no. 10: 354.
Zr–Si–N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investigated. The HiPIMS/RFMS co-sputtered Zr–Si–N films were under-stoichiometric. These films with Si content of less than 9 at.%, and N content of less than 43 at.% displayed a face-centered cubic structure. The films’ hardness and Young’s modulus exhibited an evident relationship to their compressive residual stresses. The films with 2–6 at.% Si exhibited high hardness of 33–34 GPa and high Young’s moduli of 346–373 GPa, which was accompanied with compressive residual stresses from −4.4 to −5.0 GPa.
Li-Chun Chang; Yu-Zhe Zheng; Yung-I Chen. Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering. Coatings 2018, 8, 263 .
AMA StyleLi-Chun Chang, Yu-Zhe Zheng, Yung-I Chen. Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering. Coatings. 2018; 8 (8):263.
Chicago/Turabian StyleLi-Chun Chang; Yu-Zhe Zheng; Yung-I Chen. 2018. "Mechanical Properties of Zr–Si–N Films Fabricated through HiPIMS/RFMS Co-Sputtering." Coatings 8, no. 8: 263.
A fully inkjet-printed ring-resonator bandpass filter on a liquid crystal polymer was realized by using metal-insulator-metal (MIM) structures and via-hole interconnections. Two short stub feeding lines and a ring resonator were coupled using a cross-bridge structure embedded with an MIM capacitor to provide a high selectivity passband, low insertion loss, and a more compact size. A stepped-impedance line was used as a perturbation to excite the dual mode of the ring resonator. Using the proposed method, a 29% fractional bandwidth was realized with four transmission zeros to improve the selectivity. In the passband, the minimal insertion loss and maximal return loss were -2.2 and -34.2 dB at 12.7 GHz, respectively. Fully inkjet-printed technology is recognized as a method of fabrication that results in a compact and low-cost three-dimensional integrated circuit package.
Cheng-Lin Cho; Hsuan-Ling Kao; Yung-Hsien Wu; Hsien-Chin Chiu; Li-Chun Chang. Fully Inkjet-Printed Dual-Mode Ring Bandpass Filter Using a Cross-Bridge Structure Embedded With a Metal–Insulator–Metal Capacitor. IEEE Transactions on Components, Packaging and Manufacturing Technology 2018, 8, 1869 -1875.
AMA StyleCheng-Lin Cho, Hsuan-Ling Kao, Yung-Hsien Wu, Hsien-Chin Chiu, Li-Chun Chang. Fully Inkjet-Printed Dual-Mode Ring Bandpass Filter Using a Cross-Bridge Structure Embedded With a Metal–Insulator–Metal Capacitor. IEEE Transactions on Components, Packaging and Manufacturing Technology. 2018; 8 (10):1869-1875.
Chicago/Turabian StyleCheng-Lin Cho; Hsuan-Ling Kao; Yung-Hsien Wu; Hsien-Chin Chiu; Li-Chun Chang. 2018. "Fully Inkjet-Printed Dual-Mode Ring Bandpass Filter Using a Cross-Bridge Structure Embedded With a Metal–Insulator–Metal Capacitor." IEEE Transactions on Components, Packaging and Manufacturing Technology 8, no. 10: 1869-1875.
This article presents a two-layer inkjet-printed interdigital bandpass filter using lamination bonding process on liquid crystal polymer (LCP) substrates for radio frequency electronic applications. Various percentages of torque force were applied over a 4 × 4 cm2 area with a 942 kg fixed force in the lamination bonding process. The insertion loss and surface morphology of the inkjet-printed silver film were examined on various torque forces to develop the lamination bonding process. The lamination bonding was performed at 12% torque and 270°C. A three-dimensional bandpass filter was realized with a S21 of −2.2 dB at 11.5 GHz with a 17% fractional bandwidth. A multilayer inkjet-printed bandpass filter was successfully developed to verify the design methodology and fabrication of inkjet-printing technology and lamination bonding technique for a three-dimensional integrated circuit package.
Li-Chun Chang; Cheng-Lin Cho; Sameer Kamrudin Bachani; Hsuan-Ling Kao. Inkjet-Printed Interdigital Bandpass Filter with Wide Stopband Using Multilayer Liquid Crystal Polymer Technique. International Journal of Antennas and Propagation 2018, 2018, 1 -7.
AMA StyleLi-Chun Chang, Cheng-Lin Cho, Sameer Kamrudin Bachani, Hsuan-Ling Kao. Inkjet-Printed Interdigital Bandpass Filter with Wide Stopband Using Multilayer Liquid Crystal Polymer Technique. International Journal of Antennas and Propagation. 2018; 2018 ():1-7.
Chicago/Turabian StyleLi-Chun Chang; Cheng-Lin Cho; Sameer Kamrudin Bachani; Hsuan-Ling Kao. 2018. "Inkjet-Printed Interdigital Bandpass Filter with Wide Stopband Using Multilayer Liquid Crystal Polymer Technique." International Journal of Antennas and Propagation 2018, no. : 1-7.
High-Si-content transition metal nitride coatings, which exhibited an X-ray amorphous phase, were proposed as protective coatings on glass molding dies. In a previous study, the Zr–Si–N coatings with Si contents of 24–30 at.% exhibited the hardness of Si3N4, which was higher than those of the middle-Si-content (19 at.%) coatings. In this study, the bonding characteristics of the constituent elements of Zr–Si–N coatings were evaluated through X-ray photoelectron spectroscopy. Results indicated that the Zr 3d5/2 levels were 179.14–180.22 and 180.75–181.61 eV for the Zr–N bonds in ZrN and Zr3N4 compounds, respectively. Moreover, the percentage of Zr–N bond in the Zr3N4 compound increased with increasing Si content in the Zr–Si–N coatings. The Zr–N bond of Zr3N4 dominated when the Si content was >24 at.%. Therefore, high Si content can stabilize the Zr–N compound in the M3N4 bonding structure. Furthermore, the thermal stability and chemical inertness of Zr–Si–N coatings were evaluated by conducting thermal cycle annealing at 270 °C and 600 °C in a 15-ppm O2–N2 atmosphere. The results indicated that a Zr22Si29N49/Ti/WC assembly was suitable as a protective coating against SiO2–B2O3–BaO-based glass for 450 thermal cycles.
Li-Chun Chang; Yu-Zhe Zheng; Yung-I Chen; Shan-Chun Chang; Bo-Wei Liu. Bonding Characteristics and Chemical Inertness of Zr–Si–N Coatings with a High Si Content in Glass Molding. Coatings 2018, 8, 181 .
AMA StyleLi-Chun Chang, Yu-Zhe Zheng, Yung-I Chen, Shan-Chun Chang, Bo-Wei Liu. Bonding Characteristics and Chemical Inertness of Zr–Si–N Coatings with a High Si Content in Glass Molding. Coatings. 2018; 8 (5):181.
Chicago/Turabian StyleLi-Chun Chang; Yu-Zhe Zheng; Yung-I Chen; Shan-Chun Chang; Bo-Wei Liu. 2018. "Bonding Characteristics and Chemical Inertness of Zr–Si–N Coatings with a High Si Content in Glass Molding." Coatings 8, no. 5: 181.
Yung-I Chen; Yu-Xiang Gao; Li-Chun Chang; Yi-En Ke; Bo-Wei Liu. Mechanical properties, bonding characteristics, and oxidation behaviors of Nb–Si–N coatings. Surface and Coatings Technology 2018, 350, 831 -840.
AMA StyleYung-I Chen, Yu-Xiang Gao, Li-Chun Chang, Yi-En Ke, Bo-Wei Liu. Mechanical properties, bonding characteristics, and oxidation behaviors of Nb–Si–N coatings. Surface and Coatings Technology. 2018; 350 ():831-840.
Chicago/Turabian StyleYung-I Chen; Yu-Xiang Gao; Li-Chun Chang; Yi-En Ke; Bo-Wei Liu. 2018. "Mechanical properties, bonding characteristics, and oxidation behaviors of Nb–Si–N coatings." Surface and Coatings Technology 350, no. : 831-840.
Yung-I Chen; Yu-Xiang Gao; Li-Chun Chang. Oxidation behavior of Ta Si N coatings. Surface and Coatings Technology 2017, 332, 72 -79.
AMA StyleYung-I Chen, Yu-Xiang Gao, Li-Chun Chang. Oxidation behavior of Ta Si N coatings. Surface and Coatings Technology. 2017; 332 ():72-79.
Chicago/Turabian StyleYung-I Chen; Yu-Xiang Gao; Li-Chun Chang. 2017. "Oxidation behavior of Ta Si N coatings." Surface and Coatings Technology 332, no. : 72-79.
Ta–Zr–N thin films were fabricated through co-deposition of radio-frequency magnetron sputtering and high-power impulse magnetron sputtering (HIPIMS/RFMS co-sputtering). The oxidation resistance of the fabricated films was evaluated by annealing the samples in a 15-ppm O2-N2 atmosphere at 600 °C for 4 and 8 h. The mechanical properties and surface roughness of the as-deposited and annealed thin films were evaluated. The results indicated that the HIPIMS/RFMS co-sputtered Ta–Zr–N thin films exhibited superior mechanical properties and lower surface roughness than did the conventional direct current-sputtered Ta–Zr–N thin films and HIPIMS-fabricated ZrNx thin films in both the as-deposited and annealed states.
Li-Chun Chang; Ching-Yen Chang; Ya-Wen You. Ta–Zr–N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering. Coatings 2017, 7, 189 .
AMA StyleLi-Chun Chang, Ching-Yen Chang, Ya-Wen You. Ta–Zr–N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering. Coatings. 2017; 7 (11):189.
Chicago/Turabian StyleLi-Chun Chang; Ching-Yen Chang; Ya-Wen You. 2017. "Ta–Zr–N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering." Coatings 7, no. 11: 189.
Yung-I Chen; Shan-Chun Chang; Li-Chun Chang. Oxidation resistance and mechanical properties of Zr–Si–N coatings with cyclic gradient concentration. Surface and Coatings Technology 2017, 320, 168 -173.
AMA StyleYung-I Chen, Shan-Chun Chang, Li-Chun Chang. Oxidation resistance and mechanical properties of Zr–Si–N coatings with cyclic gradient concentration. Surface and Coatings Technology. 2017; 320 ():168-173.
Chicago/Turabian StyleYung-I Chen; Shan-Chun Chang; Li-Chun Chang. 2017. "Oxidation resistance and mechanical properties of Zr–Si–N coatings with cyclic gradient concentration." Surface and Coatings Technology 320, no. : 168-173.
Li-Chun Chang; Yu-Zhe Zheng; Yu-Xiang Gao; Yung-I Chen. Mechanical properties and oxidation resistance of sputtered Cr–W–N coatings. Surface and Coatings Technology 2017, 320, 196 -200.
AMA StyleLi-Chun Chang, Yu-Zhe Zheng, Yu-Xiang Gao, Yung-I Chen. Mechanical properties and oxidation resistance of sputtered Cr–W–N coatings. Surface and Coatings Technology. 2017; 320 ():196-200.
Chicago/Turabian StyleLi-Chun Chang; Yu-Zhe Zheng; Yu-Xiang Gao; Yung-I Chen. 2017. "Mechanical properties and oxidation resistance of sputtered Cr–W–N coatings." Surface and Coatings Technology 320, no. : 196-200.
ZrNxthin films were deposited on silicon substrates using novel high-power impulse magnetron sputtering. The films were annealed at 600 °C in an atmosphere of 15 ppm O2–N2, and their performance as a protective hard coating on glass molding dies was evaluated. The as-deposited ZrNxthin films were characterized by a high nanohardness of 26–27 GPa and low surface roughness of approximately 0.5 nm. However, the mechanical properties of the ZrNxthin films declined after they were annealed owing to the formation of ZrO2 scales.
Li-Chun Chang; Yung-I Chen; Hsuan-Ling Kao. Mechanical properties and oxidation behavior of ZrNx thin films fabricated through high-power impulse magnetron sputtering deposition. Journal of Vacuum Science & Technology A 2016, 34, 02D107 .
AMA StyleLi-Chun Chang, Yung-I Chen, Hsuan-Ling Kao. Mechanical properties and oxidation behavior of ZrNx thin films fabricated through high-power impulse magnetron sputtering deposition. Journal of Vacuum Science & Technology A. 2016; 34 (2):02D107.
Chicago/Turabian StyleLi-Chun Chang; Yung-I Chen; Hsuan-Ling Kao. 2016. "Mechanical properties and oxidation behavior of ZrNx thin films fabricated through high-power impulse magnetron sputtering deposition." Journal of Vacuum Science & Technology A 34, no. 2: 02D107.
This study explored the internal oxidation of laminated Hf–Ru coatings by using cyclical gradient chemical concentration distribution along the growth direction. Hf-rich, near-equiatomic, and Ru-rich Hf–Ru coatings were prepared using direct-current magnetron cosputtering. Oxidation was examined by annealing the coatings at 500 and 600 °C in a 1% O2–99% Ar atmosphere for 30 min. The results indicated that internally oxidized laminated Hf–Ru coatings formed after annealing at 600 °C. Hf preferentially oxidized and formed monoclinic HfO2. The Ru-rich Hf0.11Ru0.89coatings exhibited a higher oxidation resistance and superior mechanical properties. This study explored the internal oxidation of laminated Hf–Ru coatings by using cyclical gradient chemical concentration distribution along the growth direction. Hf-rich, near-equiatomic, and Ru-rich Hf–Ru coatings were prepared using direct-current magnetron cosputtering. Oxidation was examined by annealing the coatings at 500 and 600 °C in a 1% O2–99% Ar atmosphere for 30 min. The results indicated that internally oxidized laminated Hf–Ru coatings formed after annealing at 600 °C. Hf preferentially oxidized and formed monoclinic HfO2. The Ru-rich Hf0.11Ru0.89coatings exhibited a higher oxidation resistance and superior mechanical properties.
Yung-I Chen; Yu-Ren Huang; Li-Chun Chang. Internal oxidation of laminated Hf–Ru coatings. Journal of Vacuum Science & Technology A 2016, 34, 02D103 .
AMA StyleYung-I Chen, Yu-Ren Huang, Li-Chun Chang. Internal oxidation of laminated Hf–Ru coatings. Journal of Vacuum Science & Technology A. 2016; 34 (2):02D103.
Chicago/Turabian StyleYung-I Chen; Yu-Ren Huang; Li-Chun Chang. 2016. "Internal oxidation of laminated Hf–Ru coatings." Journal of Vacuum Science & Technology A 34, no. 2: 02D103.
Cr–W–N coatings with a Cr interlayer were prepared using reactive direct-current magnetron cosputtering on Si and cemented carbide substrates. To investigate the chemical inertness of Cr–W–N coatings against commercial moldable SiO2–B2O3–BaO-based glass in glass molding, thermal cycle annealing at 270 °C and 600 °C was performed in a quartz tube furnace in a 15-ppm O2–N2 atmosphere. Variations in the crystalline structure, mechanical properties, and surface roughness after various annealing durations were investigated. The results indicated that Cr37W31N32 and Cr24W46N30 coatings maintained a face-centered cubic phase and exhibited superior mechanical properties and low surface roughness after up to 1000 thermal cycles; these properties were attributed to the formation of amorphous oxide scales. By contrast, Cr8W69N23 and Cr4W82N14 coatings with a nanocrystalline W phase in the as-deposited state formed WO3 oxide scales after annealing, which negatively affected their mechanical properties and raised surface roughness values.
Yung-I Chen; Yu-Ru Cheng; Li-Chun Chang; Jyh-Wei Lee. Chemical inertness of Cr–W–N coatings in glass molding. Thin Solid Films 2015, 593, 102 -109.
AMA StyleYung-I Chen, Yu-Ru Cheng, Li-Chun Chang, Jyh-Wei Lee. Chemical inertness of Cr–W–N coatings in glass molding. Thin Solid Films. 2015; 593 ():102-109.
Chicago/Turabian StyleYung-I Chen; Yu-Ru Cheng; Li-Chun Chang; Jyh-Wei Lee. 2015. "Chemical inertness of Cr–W–N coatings in glass molding." Thin Solid Films 593, no. : 102-109.
Li-Chun Chang; Ching-Yen Chang; Yung-I Chen. Mechanical properties and oxidation resistance of reactively sputtered Ta1−xZrxNy thin films. Surface and Coatings Technology 2015, 280, 27 -36.
AMA StyleLi-Chun Chang, Ching-Yen Chang, Yung-I Chen. Mechanical properties and oxidation resistance of reactively sputtered Ta1−xZrxNy thin films. Surface and Coatings Technology. 2015; 280 ():27-36.
Chicago/Turabian StyleLi-Chun Chang; Ching-Yen Chang; Yung-I Chen. 2015. "Mechanical properties and oxidation resistance of reactively sputtered Ta1−xZrxNy thin films." Surface and Coatings Technology 280, no. : 27-36.