Accurate characterization of atomic vapor cells is crucial for enhancing the sensitivity of miniature atomic magnetometers. In this study, a fast and efficient approach is developed to characterize relaxation properties of the inner surface of the 87Rb micro-electro-mechanical systems (MEMS) vapor cell. Based on the zero-field level crossing effect, the transverse relaxation rate was experimentally determined, and the depolarization coefficient of 0.097 for atom-wall collisions in the 87Rb MEMS vapor cell was obtained. The experiments demonstrated that the alkali-wall collision relaxation gradually dominates the depolarization of the 87Rb ensemble as the radius of the vapor cell decreases. This research provides a quantitative method to evaluate the effectiveness of the MEMS vapor cell anti-relaxation coatings and offers the design inspiration for MEMS atomic vapor cells from the perspective of relaxation characterization. It is beneficial for the development of weak magnetic field detections such as biomagnetism detection in ambient environments.

The increasing demand for accurate imaging spectral information in remote sensing detection has driven the development of hyperspectral remote sensing instruments towards a larger view field and higher resolution. As the core component of the spectrometer slit, the designed length reaches tens of millimeters while the precision maintained within the μm level. Such precision requirements pose challenges to traditional machining and laser processing. In this paper, a high-precision air slit was created with a large aspect ratio through MEMS technology on SOI silicon wafers. In particular, a MEMS slit was prepared with a width of 15 μm and an aspect ratio exceeding 4000:1, and a spectral spectroscopy system was created and tested with a Hg-Cd light source. As a result, the spectral spectrum was linear within the visible range, and a spectral resolution of less than 1 nm was obtained. The standard deviation of resolution is only one-fourth of that is seen in machined slits across various view fields. This research provided a reliable and novel manufacturing technique for high-precision air slits, offering technical assistance in developing high-resolution wide-coverage imaging spectrometers.

This chapter delves into the revolutionary impact of Micro-Electro-Mechanical Systems (MEMS) on optical devices, driven by advancements in materials science and micro/nano manufacturing techniques. MEMS devices offer unparalleled precision, miniaturization, and low power consumption. Their applications in both traditional and atomic optics will be explored. The incorporation of MEMS into the design of optical elements, including metasurfaces, microslits, and atomic vapor cells, has the potential to significantly enhance optical performance, device robustness, and miniaturization. This chapter presents a comprehensive investigation into the fabrication, characterization, and optimization of MEMS slits and atomic vapor cells, demonstrating their superior performance compared to traditional approaches. These examples demonstrate how MEMS technology is revolutionizing optical device engineering and expanding the possibilities in this field.