The effect of the adsorption of 5-mercaptopentyl-3-amino-1,2,4-triazole (MPATA) on the corrosive behavior of brass (Cu80/Zn20) in neutral (pH 7.4) borate buffer solutions with and without 0.01 M NaCl was studied. Electrochemical methods show significant decrease of the anodic and cathodic currents on the polarization curves in the presence of MPATA. X-ray photoelectron spectroscopy (XPS) reveals MPATA adsorption on the brass surface from an inhibitor solution. After 17 h of exposure, a mixed complex [Cu_xZn_yMPATA_z] with a thickness of about 3–3.5 nm is formed on the surface. This nanolayer has sufficient protective ability to withstand corrosion tests in a salt fog chamber: after 5 days of testing, the samples remain glossy and less than 1% of the surface has been damaged. After corrosion tests in a salt fog chamber, the surface of unprotected samples is enriched with zinc, while at the surface of inhibitor-treated samples, the copper and zinc are present in practically equal contents.

This article proposes a method for obtaining stable hydrophobic inhibitor dispersions, where the micelle core contains a hydrophobic solvent, a corrosion inhibitor and an organosilane. Such compositions can be used as polymer-type corrosion inhibitors for low-carbon steel. Using electrochemical methods, corrosion tests and X-ray photoelectron spectroscopy, features of the formation of polymeric layers of hydrophobic organosilicon dispersions were studied.

Using a complex of physical and electrochemical methods, the effect of R-substituent on the adsorption of 5-R-3-amino-1,2,4-triazoles on copper surface in neutral buffer solution was studied. Minimum concentrations C _min, which suppresses the first anodic peak of copper dissolution were found, and two different linear correlations of log C _min values on induction constant σ_I were plotted: for compounds with electron-donor and electron-withdrawing ones. Using ellipsometry, free adsorption energies −ΔG ⁰ _а,max were determined. It was shown that adsorption of triazoles with electron acceptor R, which have the highest σ_I, occurs at very low concentrations and −ΔG ⁰ _а,max = 96.6 kJ mol⁻¹ that is higher than for inhibitors of the same reaction series, but with electron-donor R (70 ÷ 85 kJ mol⁻¹). In this case, monolayers are formed, whose thicknesses are close to molecule size. The formation of chemisorption bonds is confirmed using XPS by studying the composition of adsorption layers formed by 5-CF₃-3-amino-1,2,4-triazole on the copper surface.