Ru/B₄C multilayer mirrors are used for hard X-ray monochromators with moderate spectral resolution and high integral flux. To overcome the problem of large compressive stress inherent in Ru/B₄C multilayers, a reactive sputtering technique using a mixture working gas of argon and nitrogen with different partial pressures was tested, and the fabricated multilayers had a period of 3 nm. The intrinsic stress was essentially reduced after nitridation and relaxed to zero value at approximately 15% partial pressure of nitrogen in the working gas. Interface roughness was slightly increased which can be caused by the polycrystalline structure inside the nitridated samples. More importantly, the nitridated multilayers showed an enhanced reflectance (67% at 8.04 keV photon energy) as compared with the one fabricated with pure Ar (54%). The structure analysis with transmission electron microscopy and X-ray photoelectron spectroscopy demonstrated that nitrogen incorporated into a multilayer structure was mostly located in the B₄C layers forming BN compounds, which suppressed the diffusion of boron, stabilized the interfaces and enhanced the reflectance.

The hard X-ray nanoprobe beamline is the first beamline to take advantage of the full coherent beam to attain the nanoscale focusing at the Shanghai Synchrotron Radiation Facility (SSRF). Here we introduce the beamline and specially go over the features of the multilayer Kirkpatrick-Baez focusing system and its supporting phase compensator system. The performance and stability of the phase compensator are also put to the test. By using the speckle scanning metrology, the wavefront of a focused beam was characterized and intensity distribution near the focus was reconstructed. The focusing performance was greatly enhanced by two phase compensations based on a global optimization technique, and a two-dimensional focal spot of 26 nm × 17 nm was achieved and maintained with good stability.