Rocksalt $\mathrm{Z}{\mathrm{n}}_x\mathrm{M}{\mathrm{g}}_{1-x}\mathrm{O}$ alloys are theoretically and experimentally investigated for near- and deep-UV optoelectronics with a tunable band gap of 4.2–7.8 eV. Regarding the key question about the composition $x$, at which there is a transition between the direct and indirect gaps, we performed ab initio calculations for various Zn concentrations and all possible atomic arrangements in eight- to 64-atom supercells. We show that, depending on the detailed Zn distribution (clustered, random, or uniform distribution), the alloy band gap can vary by as much as 1.27 eV. The band gap is indirect for clustered and random Zn arrangements in the supercell. For uniform Zn arrangements, the gap is also indirect, except for $x<0.5$ and atom uniform arrangements excluding Zn-O-Zn nearest neighbor bridges, for which the direct gap can be lowered below the indirect gap by about 0.1 eV. The mechanisms of band-gap fluctuation, Zn clustering, and direct-indirect band-gap transitions are analyzed and explained in terms of atomic contributions to band structures by projecting Bloch functions onto localized Wannier functions. Simultaneously, cathodoluminescence measurements were performed on a set of $\mathrm{Z}{\mathrm{n}}_x\mathrm{M}{\mathrm{g}}_{1-x}\mathrm{O}$ multiquantum wells grown by molecular beam epitaxy on MgO substrates. We observed strong and broad emission bands, redshifting with increasing Zn concentration but featuring no clear-cut evidence for any direct to indirect band-gap crossover. We argue that these alloys are well suited for deep-UV optoelectronics, thanks to the rare combination of strong exciton binding energy, coupling to phonons, and carrier localization, which is favored by the marked flattening of the top valence bands by both short-range and long-range Zn-Zn interactions.

Understanding the origin of the strong difference of electrical parameters between as grown and annealed undoped ZnO films prepared at a temperature range of 100–200 °C by thermal atomic layer deposition is essential for their future applications. In this paper, we show that the conductivity drop by up to 4 orders of magnitude as effect of post-growth annealing is accompanied by multiple simultaneous effects like a two orders of magnitude decrease of hydrogen impurity content, a strong width reduction of the luminescence peaks, and an increase of crystallite sizes influencing the carrier scattering. We show that a level of structural and optical improvement as well as the final electrical parameters of annealed films strongly depend on the previously employed growth temperature, which is related to transition from oxygen- to zinc-rich conditions influencing a type and concentration of native point defects. The growth temperature does not only influence the bandgap energy but also the binding energies of existing donors and the relative ratio between the number of donors and acceptors; hence, it determines the final electrical characteristics of the films. This means that electrical properties of undoped ZnO-atomic layer deposition films can be tuned by native defects engineering.

Effective acceptor doping of wide-band-gap semiconductors is still an outstanding problem. Beryllium has been suggested as a shallow acceptor in GaN, but despite sporadic announcements, Be-induced p -type doping has never been practically realized. Be-doped GaN possesses two luminescence bands; one at 3.38 eV and a second near 2.2 eV at an energy close to that of the parasitic yellow luminescence often found in undoped GaN crystals. We have performed high hydrostatic pressure studies of bulk, Be-doped gallium nitride crystals using the diamond anvil cell technique. We observed a splitting of the yellow luminescence line under hydrostatic pressure into two components, one which is strongly dependent on applied pressure and another whose pressure dependence is more modest. Together with hybrid functional calculations, we attribute the strongly-varying component to the beryllium–oxygen complex. The second component of the yellow luminescence possesses very similar pressure behavior to the yellow luminescence observed in undoped samples grown by the same method, behavior which we find consistent with the C _N acceptor. At higher pressure, we observe the vanishing of yellow luminescence and a rapid increase in luminescence intensity of the UV line. We explain this as the pressure-induced transformation of the Be–O complex from a highly localized state with large lattice relaxation to a delocalized state with limited lattice relaxation.