A highly sensitive Gallium Nitride (GaN) diaphragm based micro-scale pressure sensor with an AlGaN/GaN heterostructure field effect transistor (HFET) deflection transducer has been designed and fabricated for high temperature applications. The performance of the pressure sensor was studied over a pressure range of 20 kPa, which resulted in an ultra-high sensitivity of ~0.76%/kPa, with a signal-to-noise ratio as high as 16 dB, when biased optimally in the subthreshold region. A high gauge factor of 260 was determined from strain distribution in the sensor membrane obtained from finite element simulations. A repeatable sensor performance was observed over multiple pressure cycles up to a temperature of 200 °C.

Strong enhancement in a photoacoustic signal due to plasmonic absorption in Au nanostructures was measured using piezotransistive GaN microcantilevers. A pulsed 790 nm laser focused on the Au metallization of the piezotransistor resulted in a much larger photoacoustic signal compared to the non-metallized areas. Upon deposition of a 5 nm Au layer, the photoacoustic signal increased significantly for both previously metallized and non-metallized areas, while 2 nm Ni deposition decreased the photoacoustic signal, confirming the role of Au nanostructures in facilitating plasmonic absorption. Infrared microscopy images covering the boundary of Au metallized and non-metallized surfaces indicated a much larger rise in temperature of the former region with laser exposure, explaining the generation of photoacoustic signals through plasmonic absorption.

Photoacoustic (PA) detection of H₂ and NH₃ using plasmonic excitation in Pt- and Pd-decorated GaN piezotransistive microcantilevers were investigated using pulsed 520-nm laser illumination. The sensing performances of 1-nm Pt and Pd nanoparticle (NP) deposited cantilever devices were compared, of which the Pd-coated sensor devices exhibited consistently better sensing performance, with lower limit of detection and superior signal-to-noise ratio (SNR) values, compared to the Pt-coated devices. Among the two functionalization layers, Pd-coated devices were found to respond only to H₂ exposure and not to NH₃, while Pt-coated devices exhibited repeatable response to both H₂ and NH₃ exposures, highlighting the potential of the former in performing selective detection between these reducing gases. Optimization of the device-biasing conditions were found to enhance the detection sensitivity of the sensors.

This paper investigates an AlGaN/GaN triangular microcantilever with a heated apex for airflow detection utilizing a very simple two-terminal sensor configuration. Thermal microscope images were used to verify that the apex region of the microcantilever reached significantly higher temperatures than other parts under applied voltage bias. The sensor response was found to vary linearly with airflow rate when tested over a range of airflow varying from 16 to 2000 sccm. The noise-limited flow volume measurement yielded ~4 sccm resolution, while the velocity resolution was found to be 0.241 cm/s, which is one of the best reported so far for thermal sensors. The sensor was able to operate at a very low power consumption level of ~5 mW, which is one of the lowest reported for these types of sensors. The intrinsic response time of the sensor was estimated to be on the order of a few ms, limited by its thermal properties. Overall, the microcantilever sensor, with its simple geometry and measurement configurations, was found to exhibit attractive performance metrics useful for various sensing applications.

As the nano scale device performance depends on the detailed engineering of the dopant distribution, advanced doping processes are required. Progressing towards 3D-structures like FinFETs, studying the dopant gate overlap and conformality of doping calls for metrology with 3D-resolution and the ability to confine the analyzed volume to a small 3D-structure. We demonstrate that through an appropriate methodology this is feasible using Atom Probe Tomography (APT). We extract the 3D-dopant profile and important parameters such as gate overlap and profile steepness, from transistor formed with plasma doping processes. Analyzing samples with different doping processes, the APT results are entirely consistent with device performances (I_off vs. I_on).